公开(公告)号：US06522392B1

公开(公告)日：2003-02-18

申请号：US09721452

申请日：2000-11-22

Applicant: Werner Müller-Rissmann ,  Hubert Holderer ,  Rudolf Von Bünau ,  Christian Wagner ,  Jochen Becker ,  Stefan Xalter ,  Wolfgang Hummel

Inventor： Werner Müller-Rissmann ,  Hubert Holderer ,  Rudolf Von Bünau ,  Christian Wagner ,  Jochen Becker ,  Stefan Xalter ,  Wolfgang Hummel

IPC: G03B2768

CPC classification number: G03F7/70241 ,  G03F7/70258 ,  G03F7/70825

Abstract: An optical system, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. The system comprises a light source (30) as well as at least one optical element, in particular a lens or a mirror. In the region of at least one surface acted upon by the radiation (1) of the light source (30) the optical element is substantially symmetrical in relation to an axis of rotational symmetry (5). The optical element or its housing (6) is rotatably connected to a frame (7) by at least one bearing (8, 9, 10). An actuator (18) sets the optical element (25) or its housing (6) in rotation about the axis of rotational symmetry (5). The actuation cooperates with a control device (23). The latter activates the actuator (18) for rotation of the optical element at least temporarily during the period, when the optical element is exposed to lumination. In such a manner rotationally non-symmetrical image defects are compensated.

Abstract translation: 光学系统，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。 该系统包括光源（30）以及至少一个光学元件，特别是透镜或反射镜。 在由光源（30）的辐射（1）作用的至少一个表面的区域中，光学元件相对于旋转对称轴线（5）基本上是对称的。 光学元件或其壳体（6）通过至少一个轴承（8,9,10）可旋转地连接到框架（7）。 致动器（18）将光学元件（25）或其壳体（6）围绕旋转对称轴线（5）旋转。 致动与控制装置（23）配合。 当光学元件暴露于照明时，后者激活用于光学元件的致动器（18），以在光学元件暴露于照明期间的至少暂时的旋转。 以这种方式，可以补偿旋转非对称的图像缺陷。

公开(公告)号：US06521877B1

公开(公告)日：2003-02-18

申请号：US09721451

申请日：2000-11-22

Applicant: Werner Müller-Rissmann ,  Hubert Holderer ,  Rudolf Von Bünau ,  Christian Wagner ,  Jochen Becker ,  Stefan Xalter ,  Wolfgang Hummel

Inventor： Werner Müller-Rissmann ,  Hubert Holderer ,  Rudolf Von Bünau ,  Christian Wagner ,  Jochen Becker ,  Stefan Xalter ,  Wolfgang Hummel

IPC: G01J120

CPC classification number: G03F7/70891

Abstract: An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. A refractive optical element, e.g. a lens (2), is heated by the rotationally non-symmetrical radiated impingement (3) of a light source. At least one electric heating element is coupled to the optical element. Said heating element comprises a resistance heating coating carried by the optical element. In the region of the surface (3) of the optical element acted upon by the radiation of the light source the resistance heating coating is substantially optically transparent. It comprises a plurality of parallel, electrically mutually insulated coating strips (5 to 10). A heating current source (17 to 19) is additionally part of the heating element. By virtue of the combined heating of the optical element by the radiated impingement (3) and the resistance heating, a correction of imaging defects induced by illumination in the optical element is achieved by means of a symmetrical and/or homogeneous temperature and refractive index distribution.

Abstract translation: 光学布置，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。 折射光学元件，例如 透镜（2）被光源的旋转非对称辐射冲击（3）加热。 至少一个电加热元件耦合到光学元件。 所述加热元件包括由光学元件承载的电阻加热涂层。 在由光源的辐射作用的光学元件的表面（3）的区域中，电阻加热涂层基本上是光学透明的。 它包括多个平行的，电互相绝缘的涂层条（5至10）。 加热电流源（17〜19）是加热元件的另外一部分。 由于通过辐射冲击（3）和电阻加热对光学元件的组合加热，通过对称和/或均匀的温度和折射率分布来实现由光学元件中的照明引起的成像缺陷的校正 。

公开(公告)号：US06466382B2

公开(公告)日：2002-10-15

申请号：US09751132

申请日：2000-12-29

Applicant: Werner Müller-Rissmann ,  Hubert Holderer ,  Rudolf Von Bünau ,  Christian Wagner ,  Jochen Becker ,  Stefan Xalter ,  Wolfgang Hummel

Inventor： Werner Müller-Rissmann ,  Hubert Holderer ,  Rudolf Von Bünau ,  Christian Wagner ,  Jochen Becker ,  Stefan Xalter ,  Wolfgang Hummel

IPC: G02B702

CPC classification number: G03F7/70058 ,  G03F7/70216 ,  G03F7/70891 ,  G03F7/70958

Abstract: An optical arrangement, in particular a projection exposure system for microlithography, has, in particular, a slit-shaped image field or a non-rotational-symmetric illumination. As a result, an optical element (101) is exposed in a non-rotational-symmetric manner to the radiation of the light source (110, 111, 112). The optical element (101) has an absorbing coating (104, 105). The absorption of the coating (104, 105) is distributed in such a manner that it is non-rotation-symmetrical in a manner that is at least approximately complementary to the intensity distribution of the exposure to the radiation (107, 108, 109) of the light source (110, 111, 112). As a result of the energy absorbed in the coating (104, 105), an additional heating of the optical element (101) takes place that results in a better non-rotational-symmetric temperature distribution and, consequently, a compensation for light-induced imaging errors.

Abstract translation: 光学装置，特别是用于微光刻的投影曝光系统，特别是狭缝状图像场或非旋转对称照明。 结果，光学元件（101）以非旋转对称的方式暴露于光源（110,111,112）的辐射。 光学元件（101）具有吸收涂层（104,105）。 涂层（104,105）的吸收以这样的方式分布，使得其以与辐射（107,108,109）的曝光的强度分布至少近似互补的方式是非旋转对称的， 的光源（110,111,112）。 由于在涂层（104,105）中吸收的能量的结果，发生光学元件（101）的附加加热，其导致更好的非旋转对称的温度分布，并且因此补偿光诱导的 成像错误。