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公开(公告)号：US06741333B2
公开(公告)日：2004-05-25
申请号：US10406030
申请日：2003-04-02
IPC分类号： G03B2762
CPC分类号： G03F7/70283 , G03F7/70325 , G03F7/70333
摘要： A multiple image photolithography system includes a radiation source (18) projecting electromagnetic radiation along a path. A reticle cartridge (26) is located in the path of the projected radiation. The cartridge (26) includes a photomask (34,36) located in the path of the projected radiation and a Fabry-Perot interferometer (54) located in the path of the projected radiation. A radiation-sensitive material (30) is located in the path of the projected radiation such that the projected radiation encounters the reticle cartridge (26) before the projected radiation encounters the radiation-sensitive material (30).
摘要翻译： 多图像光刻系统包括沿着路径投射电磁辐射的辐射源（18）。 标线盒（26）位于投影辐射的路径中。 盒（26）包括位于投影辐射的路径中的光掩模（34,36）和位于投影辐射路径中的法布里 - 珀罗干涉仪（54）。 辐射敏感材料（30）位于投影辐射的路径中，使得投射的辐射在投影辐射遇到辐射敏感材料（30）之前遇到光罩盒（26）。
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公开(公告)号：US06567153B1
公开(公告)日：2003-05-20
申请号：US09692685
申请日：2000-10-19
IPC分类号： G03B2742
CPC分类号： G03F7/70283 , G03F7/70325 , G03F7/70333
摘要： A multiple image photolithography system includes a radiation source (18) projecting electromagnetic radiation along a path. A reticle cartridge (26) is located in the path of the projected radiation. The cartridge (26) includes a photomask (34,36) located in the path of the projected radiation and a Fabry-Perot interferometer (54) located in the path of the projected radiation. A radiation-sensitive material (30) is located in the path of the projected radiation such that the projected radiation encounters the reticle cartridge (26) before the projected radiation encounters the radiation-sensitive material (30).
摘要翻译： 多图像光刻系统包括沿着路径投射电磁辐射的辐射源（18）。 标线盒（26）位于投影辐射的路径中。 盒（26）包括位于投影辐射的路径中的光掩模（34,36）和位于投影辐射路径中的法布里 - 珀罗干涉仪（54）。 辐射敏感材料（30）位于投影辐射的路径中，使得投射的辐射在投影辐射遇到辐射敏感材料（30）之前遇到光罩盒（26）。
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公开(公告)号：US4660210A
公开(公告)日：1987-04-21
申请号：US840982
申请日：1986-03-14
CPC分类号： H01S3/09707 , H01S3/225
摘要： An improved electric discharge XeF excimer laser employs a reaction gas mixture containing NF.sub.3 and F.sub.2 in proportions that tailor the kinetics of the electrochemical reactions in order to achieve a substantial increase in power.
摘要翻译： 改进的放电XeF准分子激光器采用包含NF 3和F 2的反应气体混合物，其比例可以调整电化学反应的动力学，以实现功率的显着增加。
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公开(公告)号：US4646311A
公开(公告)日：1987-02-24
申请号：US726530
申请日：1985-04-24
CPC分类号： H01S3/225
摘要： A xenon fluoride (C.fwdarw.A) laser operating in the visible region is improved by the use of a synthesized buffer gas containing at least two components that combine to provide kinetic properties that are different from those of any single-component buffer gas.
摘要翻译： 通过使用合成的至少两种组分的合成缓冲气体来提高在可见光区域中操作的氙氟化物（C-> A）激光，以提供不同于任何单组分缓冲气体的动力学性质。
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