Radiation-sensitive composition of chemical amplification type
    1.
    发明授权
    Radiation-sensitive composition of chemical amplification type 有权
    化学放大型辐射敏感组合物

    公开(公告)号:US06358665B1

    公开(公告)日:2002-03-19

    申请号:US09529371

    申请日:2000-07-03

    IPC分类号: G03F7004

    摘要: Disclosed is a chemically amplified radiation sensitive composition containing a hydroxystyrene resin and an onium salt precursor which generates a fluorinated alkanesulfonic acid as a photoacid generator, wherein the photoacid generator is a sulfonium or iodonium salt of a fluorinated alkane sulfonic acid, represented by formula (I): Y+ASO3−  (I) wherein A represents CF3CHFCF2 or CF3CF2CF2CF2; and Y represents wherein R1, R2, R3, R4, and R5 each independently represent an alkyl group, a monocyclic or bicyclic alkyl group, a cyclic alkylcarbonyl group, a phenyl group, a naphthyl group, an anthryl group, a peryl group, a pyryl group, a thienyl group, an aralkyl group, or an arylcarbonylmethylene group, or any two of R1, R2, and R3 or R4 and R5 together represent an alkylene or an oxyalkylene which forms a five- or six-membered ring together with the interposing sulfur or iodine, said ring being optionally condensed with aryl groups.

    摘要翻译: 公开了含有羟基苯乙烯树脂和鎓盐前体的化学放大的辐射敏感性组合物,其产生氟代烷烃磺酸作为光酸产生剂,其中光酸产生剂是由式(I)表示的氟化烷烃磺酸的锍盐或碘鎓盐 ):其中A表示CF 3 CHFCF 2或CF 3 CF 2 CF 2 CF 2; Y表示其中R 1,R 2,R 3,R 4和R 5各自独立地表示烷基,单环或双环烷基,环烷基羰基,苯基,萘基,蒽基,戊基,吡啶基 基团,噻吩基,芳烷基或芳基羰基亚甲基,或R 1,R 2和R 3或R 4和R 5中的任何两个一起表示与插入物形成五元或六元环的亚烷基或氧化烯 硫或碘,所述环任选地与芳基稠合。