公开(公告)号：US4926428A

公开(公告)日：1990-05-15

申请号：US155921

申请日：1988-01-29

Applicant: Koichi Kajiyama ,  Kaoru Saito ,  Yasuo Itakura ,  Osamu Wakabayashi ,  Masahiko Kowaka ,  Tadayoshi Yamaguchi

Inventor： Koichi Kajiyama ,  Kaoru Saito ,  Yasuo Itakura ,  Osamu Wakabayashi ,  Masahiko Kowaka ,  Tadayoshi Yamaguchi

IPC: G01J1/42 ,  G01J3/26 ,  G01J9/02

CPC classification number: G01J9/0246 ,  G01J2001/4295 ,  G01J3/26

Abstract: A method and apparatus for sensing the wavelength of a laser beam using an optogalvano effect by atoms or molecules in plasma. Atoms or molecules in the plasma are irradiated with the laser beam. The impedance of the plasma at that time is sensed to sense whether the wavelength of the laser beam coincides with a predetermined absolute wavelength. The sensed result is used to control the wavelength of the laser beam.

公开(公告)号：US4856018A

公开(公告)日：1989-08-08

申请号：US5226

申请日：1987-01-20

Applicant: Yasuhiro Nozue ,  Koichi Kajiyama ,  Kaoru Saito ,  Osamu Wakabayashi ,  Masahiko Kowaka ,  Yasuo Itakura

Inventor： Yasuhiro Nozue ,  Koichi Kajiyama ,  Kaoru Saito ,  Osamu Wakabayashi ,  Masahiko Kowaka ,  Yasuo Itakura

IPC: H01S3/08 ,  H01S3/098 ,  H01S3/225

CPC classification number: H01S3/08036 ,  H01S3/08004 ,  H01S3/225 ,  H01S3/2256

Abstract: A reduced projection light source comprises a laser device for emitting laser light having a transverse mode of multimodes, and an etalon located between a chamber of the laser device and a total reflection mirror. The light source is used as an exposure light source for transfer printing an ultrafine pattern on a semiconductor wafer.

Abstract translation: 减少的投影光源包括用于发射具有横向模式的多模式的激光的激光装置，以及位于激光装置的室和全反射镜之间的标准具。 光源用作用于在半导体晶片上转印印刷超细图案的曝光光源。

公开(公告)号：US5373515A

公开(公告)日：1994-12-13

申请号：US721929

申请日：1991-06-21

Applicant: Osamu Wakabayashi ,  Yasuo Itakura ,  Masahiko Kowaka ,  Yoshino Amada

Inventor： Osamu Wakabayashi ,  Yasuo Itakura ,  Masahiko Kowaka ,  Yoshino Amada

IPC: G01J3/46 ,  G02B27/42 ,  G05D25/02 ,  H01S3/137 ,  H01S3/225 ,  H01S3/13

CPC classification number: H01S3/137 ,  H01S3/08004 ,  H01S3/225

Abstract: A laser wavelength controlling apparatus adapted for controlling the wavelength of a narrow-band oscillation laser beam at a high accuracy for long period of time even if environmental conditions such as the atmospheric temperature and pressure changes to some degree. This wavelength controlling apparatus includes a wavelength selective element (2) for narrowing the band width of the oscillating laser beam; a wavelength selection controller 9 and a wavelength selective element driver for changing the wavelength to be selected by the wavelength selective element (2); a reference light source (7) for generating a reference light for measuring the wavelength of the oscillating laser beam; a wavelength detector (8) for leading said oscillating laser beam and said reference light into a spectroscope and detecting the absolute wavelength of said oscillating laser beam on the basis of the detected value of the reference light; and a wavelength detecting driver (8a) for controlling the wavelength to be selected by said wavelength selective element in cooperation with said wavelength controller (9) so as to correspond the absolute wavelength detected by the wavelength detector with the preset wavelength.

Abstract translation: 一种激光波长控制装置，即使在大气温度和压力等环境条件有一定程度的变化的情况下，也可以长时间高精度地控制窄带振荡激光的波长。 该波长控制装置包括用于使振荡激光束的带宽变窄的波长选择元件（2） 波长选择控制器9和用于改变由波长选择元件（2）选择的波长的波长选择元件驱动器; 用于产生用于测量所述振荡激光束的波长的参考光的参考光源（7）; 用于将所述振荡激光束和所述参考光引导到分光镜中的波长检测器（8），并且基于所述参考光的检测值来检测所述振荡激光束的绝对波长; 以及波长检测驱动器（8a），用于与所述波长控制器（9）协作控制由所述波长选择元件选择的波长，以便将波长检测器检测到的绝对波长与预设波长相对应。

公开(公告)号：US06627843B2

公开(公告)日：2003-09-30

申请号：US09969782

申请日：2001-10-04

Applicant: Yasuo Itakura ,  Fumika Yoshida ,  Osamu Wakabayashi

Inventor： Yasuo Itakura ,  Fumika Yoshida ,  Osamu Wakabayashi

IPC: B23K2636

CPC classification number: H01S3/225 ,  H01S3/03 ,  H01S3/0346 ,  H01S3/036

Abstract: A casing for a laser device in which contaminants do not generate even if it is radiated with laser light, a production method and a cleaning method of the same are provided. For this purpose, the cleaning method is a method of cleaning a casing (19) for an ultraviolet laser device, an inside of which laser light (11) passes through, comprises the steps of purging the inside of the casing (19) with an inert gas, and radiating F2 cleaning laser light (16) oscillated from an F2 molecular laser light radiating device (15) to the inside of the casing (19) to thereby remove contaminants adhering to the inside of the casing (19).