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1.发明授权Sulfur atom-containing resist underlayer film forming composition and method for forming resist pattern 有权含硫原子的抗蚀剂下层膜形成组合物和形成抗蚀剂图案的方法公开(公告)号：US08318410B2
公开(公告)日：2012-11-27
申请号：US12812967
申请日：2009-01-23
IPC分类号： G03F7/11 , G03F7/38 , C08G59/14 , C08G59/42 , H01L21/027
CPC分类号： C08G59/423 , C08G59/186 , G03F7/091 , G03F7/2041
摘要： It is an object to provide a resist underlayer film forming composition having a selection ratio of dry etching rate larger than that of a resist film and exhibiting a low k value and a high n value at a short wavelength such as that of an ArF excimer laser, and enabling the formation of a resist pattern having a desired shape. When the composition is produced or used, it is required that odor due to a raw material monomer causes no problem. The object is solved by a resist underlayer film forming composition for lithography containing a polymer having in backbone thereof, a disulfide bond (S—S bond), and a solvent. The polymer may be a product of a reaction between at least one type of compound (diepoxy compound) containing two epoxy groups and at least one type of dicarboxylic acid containing a disulfide bond.
摘要翻译： 本发明的目的是提供一种抗蚀剂下层膜形成组合物，其干蚀刻速率选择比大于抗蚀剂膜的选择比，并且在短波长下表现出低k值和高n值，例如ArF准分子激光 并且能够形成具有期望形状的抗蚀剂图案。 当生产或使用组合物时，需要由于原料单体引起的气味没有问题。 该目的通过含有主链的聚合物，二硫键（S-S键）和溶剂的用于光刻的抗蚀剂下层膜形成组合物来解决。 聚合物可以是至少一种含有两个环氧基的化合物（二环氧基化合物）与含有二硫键的至少一种二羧酸之间的反应的产物。
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公开(公告)号：US4933386A
公开(公告)日：1990-06-12
申请号：US312662
申请日：1989-02-17
CPC分类号： C08K5/523
摘要： A polyarylene sulfide resin composition, being improved in thermal resistance and mouldability, comprises (A) 100 parts by weight of a polyarylene sulfide resin, (B) 0.5 to 30 parts by weight of a phosphoric ester represented by the following formula (1): ##STR1##
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3.发明授权公开(公告)号：US08023789B2
公开(公告)日：2011-09-20
申请号：US12311360
申请日：2007-09-28
CPC分类号： G02B1/045 , G02B6/02033
摘要： A plastic optical fiber cable includes: a bare optical fiber including a core made of a poly(methyl methacrylate) or a copolymer including methyl methacrylate as a major component and a cladding layer including, at least in the outermost layer, a layer made of a certain fluorine-containing olefin-based resin; and a coating layer provided on the outer surface thereof. The coating layer includes a protective coating layer, a light blocking coating layer, and a functional coating layer, the layers being provided in the order mentioned from inner side. The protective coating layer is made of a certain resin material. The light blocking coating layer is made of a nylon-based resin including, as a major component, nylon 11 or nylon 12, the nylon-based resin containing monomer and oligomer compounds derived from the nylon-based resin in an amount of a certain range. The functional coating layer is made of a nylon-based resin composition having a crystalline melting point within a certain range, the nylon-based resin composition containing a certain amount of melamine cyanurate or bromine atoms and further containing a certain amount of inorganic chromatic pigments, or the layer is made of a nylon-based resin composition having a crystalline melting point of within a certain range and an oxygen transmission rate within a certain range.
摘要翻译： 塑料光缆包括：包括由聚（甲基丙烯酸甲酯）制成的芯或包含甲基丙烯酸甲酯作为主要成分的共聚物的裸光纤，以及至少在最外层中包含由 某些含氟烯烃类树脂; 以及设置在其外表面上的涂层。 涂层包括保护涂层，遮光涂层和功能性涂层，这些层以从内侧提到的顺序提供。 保护涂层由特定的树脂材料制成。 防光涂层由尼龙类树脂制成，尼龙系树脂包括尼龙11或尼龙12作为主要成分，尼龙系树脂含有单体和衍生自尼龙系树脂的低聚物化合物，其量为一定范围 。 功能性涂层由结晶熔点在一定范围内的尼龙系树脂组合物构成，尼龙系树脂组合物含有一定量的氰尿酸三聚氰胺或溴原子，并含有一定量的无机彩色颜料， 或者该层由结晶熔点在一定范围内且氧气透过率在一定范围内的尼龙类树脂组合物制成。
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4.发明申请公开(公告)号：US20110053091A1
公开(公告)日：2011-03-03
申请号：US12812967
申请日：2009-01-23
CPC分类号： C08G59/423 , C08G59/186 , G03F7/091 , G03F7/2041
摘要： It is an object to provide a resist underlayer film forming composition having a selection ratio of dry etching rate larger than that of a resist film and exhibiting a low k value and a high n value at a short wavelength such as that of an ArF excimer laser, and enabling the formation of a resist pattern having a desired shape. When the composition is produced or used, it is required that odor due to a raw material monomer causes no problem. The object is solved by a resist underlayer film forming composition for lithography containing a polymer having in backbone thereof, a disulfide bond (S—S bond), and a solvent. The polymer may be a product of a reaction between at least one type of compound (diepoxy compound) containing two epoxy groups and at least one type of dicarboxylic acid containing a disulfide bond.
摘要翻译： 本发明的目的是提供一种抗蚀剂下层膜形成组合物，其干蚀刻速率选择比大于抗蚀剂膜的选择比，并且在短波长下表现出低k值和高n值，例如ArF准分子激光 并且能够形成具有期望形状的抗蚀剂图案。 当生产或使用组合物时，需要由于原料单体引起的气味没有问题。 该目的通过含有主链的聚合物，二硫键（S-S键）和溶剂的用于光刻的抗蚀剂下层膜形成组合物来解决。 聚合物可以是至少一种含有两个环氧基的化合物（二环氧基化合物）与含有二硫键的至少一种二羧酸之间的反应的产物。
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5.发明授权Polyarylene sulfide resin composition and molded article thereof combined with metal 失效聚芳硫醚树脂组合物及其模塑制品与金属组合
公开(公告)号：US5234770A
公开(公告)日：1993-08-10
申请号：US722385
申请日：1991-06-26
CPC分类号： C08K3/22 , C08K3/26 , Y10S428/929 , Y10T428/31533
摘要： A polyarylene sulfide resin composition comprises (A) 100 parts by weight of a polyarylene sulfide resin and (B) 0.05 to 100 parts by weight of at least one gas-trapping agent selected from zinc carbonate, zinc hydroxide and a complex salt of zinc carbonate and zinc hydroxide. It further comprises up to 400 parts by weight of an inorganic filler other than the gas-trapping agent (B) in way of material, the filler being in the form of fibers, particles and/or plates.
摘要翻译： 聚芳硫醚树脂组合物包含（A）100重量份的聚芳硫醚树脂和（B）0.05至100重量份的选自碳酸锌，氢氧化锌和碳酸锌的配盐的至少一种气体捕获剂 和氢氧化锌。 其还包含至多400重量份的除气体捕获剂（B）之外的无机填料，其材料为材料，填料为纤维，颗粒和/或板的形式。
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