Projection exposure apparatus, method for correcting positional
discrepancy of projected image, and method for determining image
formation characteristic of projection optical system
    1.
    发明授权
    Projection exposure apparatus, method for correcting positional discrepancy of projected image, and method for determining image formation characteristic of projection optical system 失效
    投影曝光装置,用于校正投影图像的位置偏差的方法以及用于确定投影光学系统的图像形成特性的方法

    公开(公告)号:US5999244A

    公开(公告)日:1999-12-07

    申请号:US743096

    申请日:1996-11-04

    IPC分类号: G03F7/20 H01L21/027

    摘要: Positional discrepancies of images of segmental areas, which are caused by stretching of a substrate in the Y direction, are corrected by changing magnifications of respective projection optical systems and inclinations of parallel plane glass pieces with respect optical axes. After that, positional discrepancies of the images after the correction are accurately detected by using a calibration system for the projection optical systems. Thus it is possible to confirm whether or not the positional discrepancies are accurately corrected. If the correction is insufficient as a result of the confirmation, at least one of correction of the magnifications of the respective projection optical systems and shift of the images projected through the respective projection optical systems onto the substrate is executed again so that amounts of the positional discrepancies are sufficiently small. On the other hand, the positional discrepancy can be easily determined by storing positional information and a detected signal concerning an image formed by a projection optical system in synchronization with a clock, followed by signal processing.

    摘要翻译: 通过改变各个投影光学系统的放大率和平行平面玻璃片相对于光轴的倾斜来校正由Y方向上的基板的拉伸引起的节段区域的图像的位置差异。 之后,通过使用投影光学系统的校准系统来精确地检测校正后的图像的位置偏差。 因此,可以确认位置差异是否被精确地校正。 如果作为确认的结果校正不足,则再次执行各个投影光学系统的放大率的校正和通过各个投影光学系统投影的图像的移位中的至少一个,使得位置 差异足够小。 另一方面,通过与时钟同步地存储与投影光学系统形成的图像有关的位置信息和检测信号,接着进行信号处理,可以容易地确定位置偏差。

    Exposure method and apparatus including focus control
    2.
    发明授权
    Exposure method and apparatus including focus control 失效
    包括焦点控制在内的曝光方法和设备

    公开(公告)号:US5936712A

    公开(公告)日:1999-08-10

    申请号:US18558

    申请日:1998-02-04

    摘要: To improve the focus accuracy during alignment and to improve the alignment accuracy even if a substrate has warpage, during alignment, an approximate focus plane is obtained by using only the detection results at focus points of focus sensors located near the ends of a substrate, close to alignment points, and without using the detection results at focus points of two central focus sensors. The auto-focus operation is performed by using the above operation results. As a result, a substrate is driven so as to be adjusted to the approximate focus plane during alignment.

    摘要翻译: 为了提高对准时的聚焦精度,即使基板翘曲,也能够提高对准精度,在对准期间,仅使用位于基板端部附近的聚焦传感器的聚焦点处的检测结果来获得近似聚焦面 到对准点,并且不在两个中央焦点传感器的对焦点处使用检测结果。 通过使用上述操作结果进行自动对焦操作。 结果,基板被驱动以在对准期间被调整到近似的聚焦平面。