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公开(公告)号:US06444255B1
公开(公告)日:2002-09-03
申请号:US09781399
申请日:2001-02-13
申请人: Yoshiyuki Nagahara , Naoya Hayamizu , Naoaki Sakurai , Noriko Okoshi , Toshitaka Nonaka , Hiroaki Furuya
发明人: Yoshiyuki Nagahara , Naoya Hayamizu , Naoaki Sakurai , Noriko Okoshi , Toshitaka Nonaka , Hiroaki Furuya
IPC分类号: B05D512
摘要: An electrode substrate is brush cleaned with a hydrogen gas dissolved water, which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12, before applying an alignment layer material on the electrode substrate. Thus, it is possible to decrease the manufacturing costs without decreasing the detergency.
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公开(公告)号:US5403683A
公开(公告)日:1995-04-04
申请号:US102229
申请日:1993-08-05
申请人: Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人: Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
CPC分类号: G03F1/48 , G11B7/261 , Y10T428/24868 , Y10T428/24917
摘要: A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
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公开(公告)号:US5260150A
公开(公告)日:1993-11-09
申请号:US631277
申请日:1990-12-20
申请人: Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人: Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
CPC分类号: G03F1/48 , G11B7/261 , Y10T428/24868 , Y10T428/24917
摘要: A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
摘要翻译: 光掩模包括透光基板,设置在基板上的多个遮光膜,形成掩模图案的遮光膜,以及设置在该基板的表面上的透光保护膜 包括遮光膜的基板,以保护遮光膜。
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公开(公告)号:US06210748B1
公开(公告)日:2001-04-03
申请号:US09098984
申请日:1998-06-17
申请人: Yoshiyuki Nagahara , Naoya Hayamizu , Naoaki Sakurai , Noriko Okoshi , Toshitaka Nonaka , Hiroaki Furuya
发明人: Yoshiyuki Nagahara , Naoya Hayamizu , Naoaki Sakurai , Noriko Okoshi , Toshitaka Nonaka , Hiroaki Furuya
IPC分类号: B05D512
CPC分类号: H01L21/02052
摘要: An electrode substrate is brush cleaned with a hydrogen gas dissolved water, which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12, before applying an alignment layer material on the electrode substrate. Thus, it is possible to decrease the manufacturing costs without decreasing the detergency.
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公开(公告)号:US5112727A
公开(公告)日:1992-05-12
申请号:US527265
申请日:1990-05-23
申请人: Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
发明人: Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
IPC分类号: G11B7/26
CPC分类号: G11B7/261 , Y10S428/913
摘要: A method of and a photomask for manufacturing an optical memory element. The manufacturing method includes the steps of: subjecting a positive type photoresist coated on a glass substrate to exposure by using the photomask capable of irradiating light onto a portion of the photoresist other than the remaining portion for forming pits of the glass substrate such that the portion of the photoresist is solubilized against developing solution; developing the photoresist by using the developing solution so as to remove the portion of the photoresist; and etching the glass substrate so as to directly form, as convex portions, the pits on a surface of the glass substrate.
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公开(公告)号:US4946730A
公开(公告)日:1990-08-07
申请号:US278378
申请日:1988-12-01
申请人: Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
发明人: Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
IPC分类号: G11B7/26
CPC分类号: G11B7/261 , Y10S428/913
摘要: A method of and a photomask for manufacturing an optical memory element. The manufacturing method includes the steps of: subjecting a positive type photoresist coated on a glass substrate to exposure, by using the photomask capable of irradiating light onto a portion of the photoresist other than the remaining portion, for forming pits on the glass substrate such that the portion of the photoresist is solubilized against developing solution; developing the photoresist by using the developing solution so as to remove the portion of the photoresist; and etching the glass substrate so as to directly form, as convex portions, the pits on a surface of the glass substrate.
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公开(公告)号:US4737197A
公开(公告)日:1988-04-12
申请号:US839198
申请日:1986-03-13
IPC分类号: H01L31/04 , H01L31/0216 , H01L31/0224 , H01L31/06
CPC分类号: H01L31/022425 , H01L31/02168 , Y02E10/50
摘要: A solar cell including a semiconductor substrate, a diffused layer provided in the semiconductor substrate by diffusion of dopant impurities, and a contact made of metal paste formed on the diffusion layer. The metal paste includes metal powder which functions as the main contact material, glass frits, an organic binder, a solvent, and an element belonging to the fifth group of the periodic table.
摘要翻译: 包括半导体衬底的太阳能电池,通过掺杂剂杂质的扩散设置在半导体衬底中的扩散层以及由形成在扩散层上的金属膏形成的接触。 金属糊料包括用作主要接触材料的金属粉末,玻璃料,有机粘合剂,溶剂和属于周期表第五组的元素。
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公开(公告)号:US5128922A
公开(公告)日:1992-07-07
申请号:US687769
申请日:1991-04-18
申请人: Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
发明人: Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
IPC分类号: B24B9/08 , G11B7/24 , G11B7/26 , G11B11/10 , G11B11/105
摘要: An optical disk with a substrate made of glass at least partially has its inner and outer peripheral surfaces polished to surface roughness of 5 .mu.m or less so as to reduce the amount of glass powder generated from these surfaces and to thereby improve the yield.
摘要翻译: 具有由玻璃制成的基板的光盘至少部分地具有抛光的表面粗糙度为5μm以下的内周面和外周面,以减少由这些表面产生的玻璃粉末的量,从而提高成品率。
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公开(公告)号:US5079113A
公开(公告)日:1992-01-07
申请号:US450438
申请日:1989-12-14
申请人: Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人: Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
IPC分类号: G03F1/48
CPC分类号: G03F1/48
摘要: A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
摘要翻译: 光掩模包括透光基板,设置在基板上的多个遮光膜,形成掩模图案的遮光膜,以及设置在该基板的表面上的透光保护膜 包括遮光膜的基板,以保护遮光膜。
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