Positive type photosensitive resin composition
    1.
    发明授权
    Positive type photosensitive resin composition 有权
    正型感光性树脂组合物

    公开(公告)号:US07847003B2

    公开(公告)日:2010-12-07

    申请号:US10565977

    申请日:2004-07-28

    IPC分类号: C08K5/13 G03F7/23 G03F7/30

    摘要: The present invention provides a positive photosensitive resin composition which can form a cured film excellent in process resistance such as heat resistance, solvent resistance or long-time baking resistance and transparency, and which is excellent in photosensitive properties such as resolution and sensitivity, and which has high storage stability and a wide process margin. Further, the present invention provides a positive photosensitive resin composition having such high reliability that no deterioration of electrical characteristics will be led in its application for liquid crystal display devices.A positive photosensitive resin composition characterized by comprising an alkali-soluble resin which is a copolymer essentially comprising an unsaturated carboxylic acid derivative and an N-substituted maleimide and which has a number average molecular weight of from 2,000 to 20,000, a 1,2-quinone diazide compound represented by the formula (1): (wherein each of D independently is a hydrogen atom or an organic group having a 1,2-quinone diazide group, R1 is a tetravalent organic group, provided that at least one of D is an organic group having a 1,2-quinone diazide group), and from 5 to 50 parts by weight, per the alkali-soluble resin, of a crosslinking compound represented by the formula (2): (wherein n is an integer of from 2 to 10, m is an integer of from 0 to 4, and R2 is a n-valent organic group).

    摘要翻译: 本发明提供一种正型感光性树脂组合物,其可以形成耐热性,耐溶剂性,耐久耐久性和透明性等耐加工性优异的固化膜,并且其分辨率和灵敏度等感光性能优异, 具有高储存稳定性和广泛的加工余量。 此外,本发明提供了一种具有高可靠性的正型感光性树脂组合物,其在液晶显示装置的应用中不会引起电特性的劣化。 一种正型感光性树脂组合物,其特征在于,含有基本上含有不饱和羧酸衍生物和N-取代马来酰亚胺并且数均分子量为2,000〜20,000的共聚物的碱溶性树脂,1,2-醌 由式(1)表示的重氮化合物:其中D各自独立地为氢原子或具有1,2-醌二叠氮基的有机基团,R 1为四价有机基团,条件是D为至少一个为 具有1,2-醌二叠氮基的有机基团)和5至50重量份的碱溶性树脂,由式(2)表示的交联化合物:其中n为2的整数 至10,m为0〜4的整数,R2为n价的有机基团)。

    Positive type photosensitive resin composition
    2.
    发明申请
    Positive type photosensitive resin composition 有权
    正型感光性树脂组合物

    公开(公告)号:US20060211797A1

    公开(公告)日:2006-09-21

    申请号:US10565977

    申请日:2004-07-28

    IPC分类号: C08K5/13

    摘要: The present invention provides a positive photosensitive resin composition which can form a cured film excellent in process resistance such as heat resistance, solvent resistance or long-time baking resistance and transparency, and which is excellent in photosensitive properties such as resolution and sensitivity, and which has high storage stability and a wide process margin. Further, the present invention provides a positive photosensitive resin composition having such high reliability that no deterioration of electrical characteristics will be led in its application for liquid crystal display devices. A positive photosensitive resin composition characterized by comprising an alkali-soluble resin which is a copolymer essentially comprising an unsaturated carboxylic acid derivative and an N-substituted maleimide and which has a number average molecular weight of from 2,000 to 20,000, a 1,2-quinone diazide compound represented by the formula (1): (wherein each of D independently is a hydrogen atom or an organic group having a 1,2-quinone diazide group, R1 is a tetravalent organic group, provided that at least one of D is an organic group having a 1,2-quinone diazide group), and from 5 to 50 parts by weight, per the alkali-soluble resin, of a crosslinking compound represented by the formula (2): (wherein n is an integer of from 2 to 10, m is an integer of from 0 to 4, and R2 is a n-valent organic group).

    摘要翻译: 本发明提供一种正型感光性树脂组合物,其可以形成耐热性,耐溶剂性,耐久耐久性和透明性等耐加工性优异的固化膜,并且其分辨率和灵敏度等感光性能优异, 具有高储存稳定性和广泛的加工余量。 此外,本发明提供了一种具有高可靠性的正型感光性树脂组合物,其在液晶显示装置的应用中不会引起电特性的劣化。 一种正型感光性树脂组合物,其特征在于,含有基本上含有不饱和羧酸衍生物和N-取代马来酰亚胺并且数均分子量为2,000〜20,000的共聚物的碱溶性树脂,1,2-醌 由式(1)表示的重氮化合物:(其中D各自独立地为氢原子或具有1,2-醌二叠氮基的有机基团,R 1为四价有机基团,提供 至少一个D是具有1,2-醌二叠氮基的有机基团)和5至50重量份的碱溶性树脂,由式(2)表示的交联化合物:( 其中n为2〜10的整数,m为0〜4的整数,R 2为n价的有机基团)。

    Polyimide precursor, polyimide, and coating solution for under layer film for image formation
    3.
    发明授权
    Polyimide precursor, polyimide, and coating solution for under layer film for image formation 有权
    聚酰亚胺前体,聚酰亚胺和用于图像形成的下层膜的涂布溶液

    公开(公告)号:US08703863B2

    公开(公告)日:2014-04-22

    申请号:US12451069

    申请日:2008-04-24

    IPC分类号: C08L33/24

    摘要: There is provided a polyimide precursor which can alter the hydrophilicity/hydrophobicity of the surface of a cured film formed readily even by a low level of ultraviolet ray irradiation; and a polyimide produced from the polyimide precursor. The polyimide precursor having a structure represented by the following formula (1): (where A represents a tetravalent organic group; B represents a bivalent organic group having a thiol ester bond in its main chain; R1 and R2 independently represent a hydrogen atom or a univalent organic group; and n represents a natural number).

    摘要翻译: 提供了即使通过低水平的紫外线照射也能够容易地改变形成的固化膜的表面的亲水性/疏水性的聚酰亚胺前体; 和由聚酰亚胺前体制成的聚酰亚胺。 具有由下式(1)表示的结构的聚酰亚胺前体:(其中A表示四价有机基团; B表示其主链具有硫羟酸酯键的二价有机基团; R 1和R 2独立地表示氢原子或 一价有机基团; n表示自然数)。

    POLYIMIDE PRECURSOR, POLYIMIDE, AND COATING SOLUTION FOR UNDER LAYER FILM FOR IMAGE FORMATION
    4.
    发明申请
    POLYIMIDE PRECURSOR, POLYIMIDE, AND COATING SOLUTION FOR UNDER LAYER FILM FOR IMAGE FORMATION 有权
    聚酰亚胺前体,聚酰亚胺和涂料溶液用于图像形成的层膜

    公开(公告)号:US20100069569A1

    公开(公告)日:2010-03-18

    申请号:US12451069

    申请日:2008-04-24

    IPC分类号: C08L33/24 C08G73/10 C08F2/48

    摘要: There is provided a polyimide precursor which can alter the hydrophilicity/hydrophobicity of the surface of a cured film formed readily even by a low level of ultraviolet ray irradiation; and a polyimide produced from the polyimide precursor. The polyimide precursor having a structure represented by the following formula (1): (where A represents a tetravalent organic group; B represents a bivalent organic group having a thiol ester bond in its main chain; R1 and R2 independently represent a hydrogen atom or a univalent organic group; and n represents a natural number).

    摘要翻译: 提供了即使通过低水平的紫外线照射也能够容易地改变形成的固化膜的表面的亲水性/疏水性的聚酰亚胺前体; 和由聚酰亚胺前体制成的聚酰亚胺。 具有由下式(1)表示的结构的聚酰亚胺前体:(其中A表示四价有机基团; B表示其主链具有硫羟酸酯键的二价有机基团; R 1和R 2独立地表示氢原子或 一价有机基团; n表示自然数)。

    COATING LIQUID FOR GATE INSULATING FILM, GATE INSULATING FILM AND ORGANIC TRANSISTOR
    5.
    发明申请
    COATING LIQUID FOR GATE INSULATING FILM, GATE INSULATING FILM AND ORGANIC TRANSISTOR 审中-公开
    盖绝缘膜,栅绝缘膜和有机晶体管的涂层液

    公开(公告)号:US20090184347A1

    公开(公告)日:2009-07-23

    申请号:US12302031

    申请日:2007-05-23

    IPC分类号: H01L51/10 C08G69/08

    摘要: To provide a coating fluid for a gate insulating film, which can be baked at a low temperature of at most 180° C.; a gate insulating film having excellent solvent resistance and further having good characteristics in e.g. specific resistance or semiconductor mobility; and an organic transistor employing the gate insulating film.A coating fluid for a gate insulating film, which comprises a polyimide obtainable by cyclodehydration of a polyamic acid having repeating units of a specific structure, a gate insulating film employing the coating fluid, and the organic transistor employing the gate insulating film.

    摘要翻译: 提供可以在至多180℃的低温下烘烤的栅极绝缘膜的涂布液; 具有优异的耐溶剂性并且在其中具有良好特性的栅极绝缘膜。 电阻或半导体迁移率; 以及采用该栅极绝缘膜的有机晶体管。 一种用于栅极绝缘膜的涂布液,其包含通过使具有特定结构的重复单元的聚酰胺酸的环化脱水,使用该涂布液的栅极绝缘膜和使用该栅极绝缘膜的有机晶体管获得的聚酰亚胺。