摘要:
The present invention provides a positive photosensitive resin composition which can form a cured film excellent in process resistance such as heat resistance, solvent resistance or long-time baking resistance and transparency, and which is excellent in photosensitive properties such as resolution and sensitivity, and which has high storage stability and a wide process margin. Further, the present invention provides a positive photosensitive resin composition having such high reliability that no deterioration of electrical characteristics will be led in its application for liquid crystal display devices.A positive photosensitive resin composition characterized by comprising an alkali-soluble resin which is a copolymer essentially comprising an unsaturated carboxylic acid derivative and an N-substituted maleimide and which has a number average molecular weight of from 2,000 to 20,000, a 1,2-quinone diazide compound represented by the formula (1): (wherein each of D independently is a hydrogen atom or an organic group having a 1,2-quinone diazide group, R1 is a tetravalent organic group, provided that at least one of D is an organic group having a 1,2-quinone diazide group), and from 5 to 50 parts by weight, per the alkali-soluble resin, of a crosslinking compound represented by the formula (2): (wherein n is an integer of from 2 to 10, m is an integer of from 0 to 4, and R2 is a n-valent organic group).
摘要:
The present invention provides a positive photosensitive resin composition which can form a cured film excellent in process resistance such as heat resistance, solvent resistance or long-time baking resistance and transparency, and which is excellent in photosensitive properties such as resolution and sensitivity, and which has high storage stability and a wide process margin. Further, the present invention provides a positive photosensitive resin composition having such high reliability that no deterioration of electrical characteristics will be led in its application for liquid crystal display devices. A positive photosensitive resin composition characterized by comprising an alkali-soluble resin which is a copolymer essentially comprising an unsaturated carboxylic acid derivative and an N-substituted maleimide and which has a number average molecular weight of from 2,000 to 20,000, a 1,2-quinone diazide compound represented by the formula (1): (wherein each of D independently is a hydrogen atom or an organic group having a 1,2-quinone diazide group, R1 is a tetravalent organic group, provided that at least one of D is an organic group having a 1,2-quinone diazide group), and from 5 to 50 parts by weight, per the alkali-soluble resin, of a crosslinking compound represented by the formula (2): (wherein n is an integer of from 2 to 10, m is an integer of from 0 to 4, and R2 is a n-valent organic group).
摘要:
There is provided a polyimide precursor which can alter the hydrophilicity/hydrophobicity of the surface of a cured film formed readily even by a low level of ultraviolet ray irradiation; and a polyimide produced from the polyimide precursor. The polyimide precursor having a structure represented by the following formula (1): (where A represents a tetravalent organic group; B represents a bivalent organic group having a thiol ester bond in its main chain; R1 and R2 independently represent a hydrogen atom or a univalent organic group; and n represents a natural number).
摘要翻译:提供了即使通过低水平的紫外线照射也能够容易地改变形成的固化膜的表面的亲水性/疏水性的聚酰亚胺前体; 和由聚酰亚胺前体制成的聚酰亚胺。 具有由下式(1)表示的结构的聚酰亚胺前体:(其中A表示四价有机基团; B表示其主链具有硫羟酸酯键的二价有机基团; R 1和R 2独立地表示氢原子或 一价有机基团; n表示自然数)。
摘要:
There is provided a polyimide precursor which can alter the hydrophilicity/hydrophobicity of the surface of a cured film formed readily even by a low level of ultraviolet ray irradiation; and a polyimide produced from the polyimide precursor. The polyimide precursor having a structure represented by the following formula (1): (where A represents a tetravalent organic group; B represents a bivalent organic group having a thiol ester bond in its main chain; R1 and R2 independently represent a hydrogen atom or a univalent organic group; and n represents a natural number).
摘要翻译:提供了即使通过低水平的紫外线照射也能够容易地改变形成的固化膜的表面的亲水性/疏水性的聚酰亚胺前体; 和由聚酰亚胺前体制成的聚酰亚胺。 具有由下式(1)表示的结构的聚酰亚胺前体:(其中A表示四价有机基团; B表示其主链具有硫羟酸酯键的二价有机基团; R 1和R 2独立地表示氢原子或 一价有机基团; n表示自然数)。
摘要:
To provide a coating fluid for a gate insulating film, which can be baked at a low temperature of at most 180° C.; a gate insulating film having excellent solvent resistance and further having good characteristics in e.g. specific resistance or semiconductor mobility; and an organic transistor employing the gate insulating film.A coating fluid for a gate insulating film, which comprises a polyimide obtainable by cyclodehydration of a polyamic acid having repeating units of a specific structure, a gate insulating film employing the coating fluid, and the organic transistor employing the gate insulating film.