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公开(公告)号:US11261338B2
公开(公告)日:2022-03-01
申请号:US16671758
申请日:2019-11-01
申请人: AC PRODUCTS, INC.
发明人: David Tomlinson , Bryan Vu , James Wichmann , Peter Weissman , Gregory Dancy , Thomas Farrell
IPC分类号: C09D9/00 , C09D175/04 , C09D175/02 , C23C18/26 , C23F1/14
摘要: A method for reducing adhesion between a maskant and a substrate, wherein the maskant is adhered to a surface of the substrate, the method comprising applying a composition to the maskant.
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公开(公告)号:US12024649B2
公开(公告)日:2024-07-02
申请号:US17577592
申请日:2022-01-18
申请人: AC PRODUCTS, INC.
发明人: David Tomlinson , Bryan Vu , James Wichmann , Peter Weissman , Gregory Dancy , Thomas Farrell
IPC分类号: C09D9/00 , C09D175/02 , C09D175/04 , C23C18/26 , C23F1/14
CPC分类号: C09D9/005 , C09D175/02 , C09D175/04 , C23C18/26 , C23F1/14
摘要: A method for reducing adhesion between a maskant and a substrate, wherein the maskant is adhered to a surface of the substrate, the method comprising applying a composition to the maskant.
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公开(公告)号:US20240166829A1
公开(公告)日:2024-05-23
申请号:US18493335
申请日:2023-10-24
申请人: AC Products Inc.
发明人: Thomas P. Farrell , Bryan Vu , David Tomlinson , Peter Weissman
IPC分类号: C08J5/18 , B32B15/082 , B32B15/20 , B32B27/18 , B32B27/30 , C23C14/04 , C23C14/24 , C23C16/04 , C23C18/16
CPC分类号: C08J5/18 , B32B15/082 , B32B15/20 , B32B27/18 , B32B27/302 , C23C14/042 , C23C14/24 , C23C16/042 , C23C18/1605 , B29C48/154 , B32B2264/102 , B32B2270/00 , B32B2307/54 , C08J2347/00 , C08J2423/22
摘要: In one aspect, the present disclosure provides a polymer film with a low glass transition temperature. In one embodiment, when in contact with a metal substrate, the polymer film adheres to the metal substrate under heating and/or mechanical pressure. In one embodiment, the polymer film comprises a butadiene copolymer and a butylene polymer. In another aspect, the present disclosure further provides a method of masking a metal substrate using the polymer film. In yet another aspect, the present disclosure provides a method of chemically or electrochemically processing a metal substrate that is masked with the polymer film.
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