公开(公告)号：US20140145342A1

公开(公告)日：2014-05-29

申请号：US13686184

申请日：2012-11-27

Applicant: ADVANCED MICRO DEVICES, INC.

Inventor： Richard T. Schultz ,  Omid Rowhani ,  Charles P. Tung

IPC: H01L21/3213 ,  H01L23/48

CPC classification number: H01L23/48 ,  G03F7/0035 ,  G03F7/70466 ,  H01L21/31144 ,  H01L2924/0002 ,  H01L2924/0001 ,  H01L2924/00

Abstract: Methods, a computer readable medium, and an apparatus are provided. A method includes and the computer readable medium is configured for decomposing an overall pattern into a first mask pattern that includes a power rail base pattern and into a second mask pattern, and generating on the second mask pattern a power rail insert pattern that is at least partially aligned with the power rail base pattern of the first mask pattern. The apparatus is produced by photolithography using photolithographic masks generated by the method.

Abstract translation: 提供了方法，计算机可读介质和装置。 一种方法包括并且所述计算机可读介质被配置用于将整体图案分解为包括电力轨基座图案并进入第二掩模图案的第一掩模图案，并且在所述第二掩模图案上生成至少为电动轨迹插入图案 部分地与第一掩模图案的电源轨基座图案对准。 该装置通过使用通过该方法产生的光刻掩模的光刻制造。

公开(公告)号：US10283437B2

公开(公告)日：2019-05-07

申请号：US13686184

申请日：2012-11-27

Applicant: ADVANCED MICRO DEVICES, INC.

Inventor： Richard T. Schultz ,  Omid Rowhani ,  Charles P. Tung

IPC: G03F7/20 ,  H01L23/48 ,  H01L21/311 ,  G03F7/00

Abstract: Methods, a computer readable medium, and an apparatus are provided. A method includes and the computer readable medium is configured for decomposing an overall pattern into a first mask pattern that includes a power rail base pattern and into a second mask pattern, and generating on the second mask pattern a power rail insert pattern that is at least partially aligned with the power rail base pattern of the first mask pattern. The apparatus is produced by photolithography using photolithographic masks generated by the method.