Electron capture dissociation (ECD) utilizing electron beam generated low energy electrons

    公开(公告)号:US11217437B2

    公开(公告)日:2022-01-04

    申请号:US16298654

    申请日:2019-03-11

    IPC分类号: H01J49/00 H01J49/06 H01J49/08

    摘要: Electron capture dissociation (ECD) is performed by transmitting an electron beam through a cell along an electron beam axis, generating plasma in the cell by energizing a gas with the electron beam, and transmitting an ion beam through the interaction region along an ion beam axis to produce fragment ions. Generating the plasma forms an interaction region in the cell spaced from and not intersecting the electron beam, and including low-energy electrons effective for ECD. The ion beam axis may be at an angle to and offset from the ion beam axis, such that the electron beam does not intersect the ion beam.

    PLASMA CLEANING FOR MASS SPECTROMETERS
    2.
    发明申请
    PLASMA CLEANING FOR MASS SPECTROMETERS 有权
    等离子体清洗大量光谱仪

    公开(公告)号:US20160035550A1

    公开(公告)日:2016-02-04

    申请号:US14814147

    申请日:2015-07-30

    CPC分类号: H01J49/00

    摘要: A mass spectrometry (MS) system may be cleaned by generating plasma and contacting an internal surface of the system to be cleaned with the plasma. The system may be switched between operating in an analytical mode and in a cleaning mode. In the analytical mode a sample is analyzed, and plasma may or may not be actively generated. In the cleaning mode the plasma is actively generated, and the sample may or may not be analyzed.

    摘要翻译: 质谱(MS)系统可以通过产生等离子体并且与待清洁系统的内表面与等离子体接触来清洁。 可以在分析模式和清洁模式之间切换系统。 在分析模式下,分析样品,并且等离子体可能或可能不被主动产生。 在清洁模式中,主动地产生等离子体,并且样品可以被分析也可以不被分析。

    Plasma generation device with microstrip resonator
    4.
    发明授权
    Plasma generation device with microstrip resonator 有权
    带微带谐振器的等离子体发生装置

    公开(公告)号:US09330889B2

    公开(公告)日:2016-05-03

    申请号:US13939373

    申请日:2013-07-11

    IPC分类号: H01J7/46 H01J37/32 H05H1/46

    摘要: A plasma generation device, a system including a plasma generation device, and a method of generating plasma and vacuum UV (VUV) photons are described. In a representative embodiment, plasma generation device, includes: a substrate having a first surface and a second surface; a resonant ring-shaped structure disposed over the first surface of the substrate, the resonant ring-shaped structure having dimensions selected to support at least one standing wave having more than one electric field maximum along a length of the resonant ring-shaped structure; a ground plane disposed on the second surface of the substrate; and an apparatus configured to provide a gas at locations of the electric field maxima.

    摘要翻译: 描述了等离子体产生装置,包括等离子体产生装置的系统和产生等离子体和真空UV(VUV)光子的方法。 在代表性的实施例中,等离子体产生装置包括:具有第一表面和第二表面的基底; 设置在所述基板的所述第一表面上的共振环形结构,所述共振环形结构具有选择为沿所述共振环形结构的长度支撑具有多于一个电场最大值的至少一个驻波的尺寸; 设置在所述基板的第二表面上的接地平面; 以及被配置为在电场最大值的位置处提供气体的装置。

    PLASMA-BASED PHOTON SOURCE, ION SOURCE, AND RELATED SYSTEMS AND METHODS
    5.
    发明申请
    PLASMA-BASED PHOTON SOURCE, ION SOURCE, AND RELATED SYSTEMS AND METHODS 有权
    基于等离子体的光电源,离子源及相关系统和方法

    公开(公告)号:US20150028222A1

    公开(公告)日:2015-01-29

    申请号:US13951301

    申请日:2013-07-25

    IPC分类号: H01J27/24 H01J49/16

    CPC分类号: H01J27/24 H01J49/162

    摘要: A photon source includes a plasma source for generating plasma and a photon guide through which the plasma travels. The photon guide includes an inner surface configured for reflecting photons emitted from the plasma. As the plasma travels through the photon guide, plasma electrons and ions recombine at the inner surface, whereby the predominant species emitted from an outlet of the photon guide are the photons and neutral particles, with few or no plasma electrons and ions being emitted.

    摘要翻译: 光子源包括用于产生等离子体的等离子体源和等离子体穿过的光子引导件。 光子引导件包括被配置为反射从等离子体发射的光子的内表面。 当等离子体穿过光子导管时,等离子体电子和离子在内表面复合,由此从光子导子的出口发射的主要物质是光子和中性粒子,几乎没有或没有发射等离子体电子和离子。

    Ion throughput pump and method
    6.
    发明授权

    公开(公告)号:US10455683B2

    公开(公告)日:2019-10-22

    申请号:US15169697

    申请日:2016-05-31

    发明人: Mark Denning

    IPC分类号: H05H3/02 H01J41/12 H01J27/14

    摘要: An ion throughput pump (ITP) includes a pump inlet configured to communicate with a vacuum chamber; an ionization source fluidly communicating with the vacuum chamber via the pump inlet and configured for ionizing gas species received from the vacuum chamber; a pump outlet; ion optics configured for accelerating ions produced by the ionization source toward the pump outlet; and a roughing pump stage configured for receiving the ions from the ionization source, producing neutral species from the ions, and pumping the neutral species through the pump outlet.

    Plasma-based photon source, ion source, and related systems and methods
    7.
    发明授权
    Plasma-based photon source, ion source, and related systems and methods 有权
    基于等离子体的光子源,离子源及相关系统和方法

    公开(公告)号:US09029797B2

    公开(公告)日:2015-05-12

    申请号:US13951301

    申请日:2013-07-25

    IPC分类号: H01J49/00 H01J27/24 H01J49/16

    CPC分类号: H01J27/24 H01J49/162

    摘要: A photon source includes a plasma source for generating plasma and a photon guide through which the plasma travels. The photon guide includes an inner surface configured for reflecting photons emitted from the plasma. As the plasma travels through the photon guide, plasma electrons and ions recombine at the inner surface, whereby the predominant species emitted from an outlet of the photon guide are the photons and neutral particles, with few or no plasma electrons and ions being emitted.

    摘要翻译: 光子源包括用于产生等离子体的等离子体源和等离子体穿过的光子引导件。 光子引导件包括被配置为反射从等离子体发射的光子的内表面。 当等离子体穿过光子导管时,等离子体电子和离子在内表面复合,由此从光子导子的出口发射的主要物质是光子和中性粒子,几乎没有或没有发射等离子体电子和离子。

    PLASMA GENERATION DEVICE WITH MICROSTRIP RESONATOR
    8.
    发明申请
    PLASMA GENERATION DEVICE WITH MICROSTRIP RESONATOR 有权
    具有微波共振器的等离子体生成装置

    公开(公告)号:US20150015140A1

    公开(公告)日:2015-01-15

    申请号:US13939373

    申请日:2013-07-11

    IPC分类号: H01J37/32

    摘要: A plasma generation device, a system comprising a plasma generation device, and a method of generating plasma and vacuum UV (VUV) photons are described. In a representative embodiment, plasma generation device, comprises: a substrate having a first surface and a second surface; a resonant ring-shaped structure disposed aver the first surface of the substrate, the resonant ring-shaped structure having dimensions selected to support at least one standing wave having more than one electric field maximum along a length of the resonant ring-shaped structure; a ground plane disposed on the second surface of the substrate; and an apparatus configured to provide a gas at locations of the electric field maxima,

    摘要翻译: 描述了等离子体产生装置,包括等离子体产生装置的系统和产生等离子体和真空UV(VUV)光子的方法。 在代表性的实施例中,等离子体产生装置包括:具有第一表面和第二表面的基底; 一个谐振环形结构,设置在基板的第一表面之外,所述共振环形结构的尺寸被选择为沿着所述谐振环形结构的长度支撑具有多于一个电场最大值的至少一个驻波; 设置在所述基板的第二表面上的接地平面; 以及被配置为在电场最大值的位置处提供气体的装置,

    ELECTRON CAPTURE DISSOCIATION (ECD) UTILIZING ELECTRON BEAM GENERATED LOW ENERGY ELECTRONS

    公开(公告)号:US20190287775A1

    公开(公告)日:2019-09-19

    申请号:US16298654

    申请日:2019-03-11

    IPC分类号: H01J49/00 H01J49/08 H01J49/06

    摘要: Electron capture dissociation (ECD) is performed by transmitting an electron beam through a cell along an electron beam axis, generating plasma in the cell by energizing a gas with the electron beam, and transmitting an ion beam through the interaction region along an ion beam axis to produce fragment ions. Generating the plasma forms an interaction region in the cell spaced from and not intersecting the electron beam, and including low-energy electrons effective for ECD. The ion beam axis may be at an angle to and offset from the ion beam axis, such that the electron beam does not intersect the ion beam.

    Plasma cleaning for mass spectrometers
    10.
    发明授权
    Plasma cleaning for mass spectrometers 有权
    质谱仪等离子体清洗

    公开(公告)号:US09589775B2

    公开(公告)日:2017-03-07

    申请号:US14814147

    申请日:2015-07-30

    IPC分类号: H01J49/26 H01J49/00

    CPC分类号: H01J49/00

    摘要: A mass spectrometry (MS) system may be cleaned by generating plasma and contacting an internal surface of the system to be cleaned with the plasma. The system may be switched between operating in an analytical mode and in a cleaning mode. In the analytical mode a sample is analyzed, and plasma may or may not be actively generated. In the cleaning mode the plasma is actively generated, and the sample may or may not be analyzed.

    摘要翻译: 质谱(MS)系统可以通过产生等离子体并且与待清洁系统的内表面与等离子体接触来清洁。 可以在分析模式和清洁模式之间切换系统。 在分析模式下,分析样品,并且等离子体可能或可能不被主动产生。 在清洁模式中,主动地产生等离子体,并且样品可以被分析也可以不被分析。