公开(公告)号：US20180122615A1

公开(公告)日：2018-05-03

申请号：US15846752

申请日：2017-12-19

申请人： PHOENIX NUCLEAR LABS LLC

发明人： Joseph D. Sherman ,  Evan R. Sengbusch ,  Ross F. Radel ,  Arne V. Kobernik ,  Tye T. Gribb ,  Preston J. Barrows ,  Christopher M. Seyfert ,  Logan D. Campbell ,  Daniel J. Swanson ,  Eric D. Risley ,  Jin W. Lee ,  Kevin D. Meaney

IPC分类号： H01J27/02 ,  H01J37/08 ,  H01J27/22 ,  H01J27/16 ,  H01J27/18

CPC分类号： H01J27/028 ,  H01J27/024 ,  H01J27/16 ,  H01J27/18 ,  H01J27/22 ,  H01J37/08

摘要： A negative ion source includes a plasma chamber, a microwave source, a negative ion converter, a magnetic filter and a beam formation mechanism. The plasma chamber contains gas to be ionized. The microwave source transmits microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms. The negative ion converter converts the hyperthermal neutral atoms to negative ions. The magnetic filter reduces a temperature of an electron density provided between the plasma chamber and the negative ion converter. The beam formation mechanism extract the negative ions.

公开(公告)号：US09899193B1

公开(公告)日：2018-02-20

申请号：US15341040

申请日：2016-11-02

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Bon-Woong Koo ,  Yong-Seok Hwang ,  Kyong-Jae Chung

IPC分类号： H01J37/08 ,  H01J37/32

CPC分类号： H01J37/32458 ,  H01J27/16 ,  H01J37/08 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32412 ,  H01J37/32422 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32623 ,  H01J37/32669 ,  H01J2237/024 ,  H01J2237/065 ,  H01J2237/31701 ,  H01J2237/327 ,  H01J2237/3365

摘要： Provided herein are approaches for dynamically modifying plasma volume in an ion source chamber by positioning an end plate and radio frequency (RF) antenna at a selected axial location. In one approach, an ion source includes a plasma chamber having a longitudinal axis extending between a first end wall and a second end wall, and an RF antenna adjacent a plasma within the plasma chamber, wherein the RF antenna is configured to provide RF energy to the plasma. The ion source may further include an end plate disposed within the plasma chamber, adjacent the first end wall, the end plate actuated along the longitudinal axis between a first position and a second position to adjust a volume of the plasma. By providing an actuable end plate and RF antenna, plasma characteristics may be dynamically controlled to affect ion source characteristics, such as composition of ion species, including metastable neutrals.

公开(公告)号：US09875884B2

公开(公告)日：2018-01-23

申请号：US14634745

申请日：2015-02-28

申请人： Agilent Technologies, Inc.

发明人： Viorica Lopez-Avila ,  Mark Denning ,  Mehrnoosh Vahidpour

IPC分类号： H01J49/10 ,  H01J49/04 ,  H01J49/00 ,  H01J49/16 ,  H05H1/46 ,  G01N21/71 ,  G01N30/95 ,  H01J27/16

CPC分类号： H01J49/102 ,  G01N21/714 ,  G01N30/95 ,  H01J27/16 ,  H01J49/0031 ,  H01J49/0409 ,  H01J49/049 ,  H01J49/105 ,  H01J49/161 ,  H05H1/46

摘要： An ion source includes a plasma generator for supplying plasma at an ionization region proximate to a sample surface. The plasma generator applies energy that may be utilized for desorbing analytes from the sample surface as well as for generating plasma by which analytes are excited or ionized. Desorption and ionization/excitation may be controlled as individual modes. The ion source may be interfaced with an ion-based or optical-based spectrometer. A sample support may be provided, which may be capable of performing analytical separation.

公开(公告)号：US20170338075A1

公开(公告)日：2017-11-23

申请号：US15522490

申请日：2015-10-27

申请人： ENTEGRIS, INC.

发明人： Oleg BYL ,  Joseph D SWENEY

IPC分类号： H01J27/20 ,  H01J37/08 ,  H01J27/16 ,  H01L21/265 ,  H01J37/317

CPC分类号： H01J27/20 ,  H01J27/16 ,  H01J37/08 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/082 ,  H01L21/265

摘要： An ion source apparatus which generates dopant species in a manner enabling low vapor pressure dopant source materials to be employed. The ion source apparatus (10), comprising: an ion source chamber (12); and a consumable structure in or associated with the ion source chamber (12), said consumable structure comprising a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber. For example, the consumable structure is a dopant gas feed line (14) comprising a pipe or conduit having an interior layer formed of a solid dopant source material.

公开(公告)号：US09734991B2

公开(公告)日：2017-08-15

申请号：US14811272

申请日：2015-07-28

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Daniel Distaso ,  Svetlana B. Radovanov ,  Joseph P. Dzengeleski

IPC分类号： H01J37/32 ,  H01J27/02 ,  H01J27/16 ,  H01J37/08

CPC分类号： H01J37/32146 ,  H01J27/024 ,  H01J27/028 ,  H01J27/16 ,  H01J37/08 ,  H01J37/3211 ,  H01J37/32422 ,  H01J2237/0815 ,  H01J2237/0827 ,  H01J2237/3151 ,  H01J2237/31701 ,  H01J2237/31732

摘要： An apparatus and method for the creation of negative ion beams is disclosed. The apparatus includes an RF ion source, having an extraction aperture. An antenna disposed proximate a dielectric window is energized by a pulsed RF power supply. While the RF power supply is actuated, a plasma containing primarily positive ions and electrons is created. When the RF power supply is deactivated, the plasma transforms into an ion-ion plasma. Negative ions may be extracted from the RF ion source while the RF power supply is deactivated. These negative ions, in the form of a negative ribbon ion beam, may be directed toward a workpiece at a specific incident angle. Further, both a positive ion beam and a negative ion beam may be extracted from the same ion source by pulsing the bias power supply multiple times each period.

公开(公告)号：US09655223B2

公开(公告)日：2017-05-16

申请号：US14028305

申请日：2013-09-16

申请人： Oregon Physics, LLC

发明人： Noel S. Smith ,  Roderick W. Boswell ,  Paul P. Tesch ,  Noel P. Martin

IPC分类号： H05H1/24 ,  H05H1/46 ,  H01J37/08 ,  H01J37/32 ,  H01J27/16 ,  H01J49/10 ,  H01J49/14

CPC分类号： H05H1/24 ,  H01J27/16 ,  H01J37/08 ,  H01J37/32082 ,  H01J49/105 ,  H01J49/142 ,  H05H1/46 ,  H05H2001/4667

摘要： In a plasma ion source having an induction coil adjacent to a reactor chamber for inductively coupling power into the plasma from a radio frequency power source and designed for negative and positive ion extraction, a method for operating the source according to the invention comprises providing radio frequency power to the induction coil with a RF amplifier operating with a variable frequency connected to a matching network mainly comprised of fixed value capacitors. In this device the impedance between the RF power source and the plasma ion source is matched by tuning the RF frequency rather than adjusting the capacitance of the matching network. An option to use a RF power source utilizing lateral diffused metal oxide semiconductor field effect transistor based amplifiers is disclosed.

公开(公告)号：US20150357166A1

公开(公告)日：2015-12-10

申请号：US14734905

申请日：2015-06-09

申请人： FEI Company

发明人： Sean Kellogg ,  Anthony Graupera ,  William N. Parker ,  Andrew B. Wells ,  Mark W. Utlaut ,  Walter Skoczylas ,  Gregory A. Schwind ,  Noel Smith ,  Shouyin Zhang

IPC分类号： H01J37/32 ,  H01J9/02

CPC分类号： H01J37/32605 ,  H01J9/02 ,  H01J27/16 ,  H01J37/04 ,  H01J37/08 ,  H01J2237/032

摘要： An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.

摘要翻译： 用于聚焦离子束系统的电感耦合等离子体带电粒子源包括具有可拆卸地附接的源电极的等离子体反应室。 紧固机构将源电极与等离子体反应室连接，并形成导热的真空密封。 使用可移动的源电极，现在可以提高等离子体源管的可用性和再利用。

公开(公告)号：US09196451B2

公开(公告)日：2015-11-24

申请号：US13353032

申请日：2012-01-18

申请人： Shouyin Zhang ,  Noel Smith ,  Walter Skoczylas

发明人： Shouyin Zhang ,  Noel Smith ,  Walter Skoczylas

IPC分类号： H01J27/00 ,  H01J37/08 ,  H01J27/16

CPC分类号： H01J37/08 ,  H01J27/16 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/026 ,  H01J2237/038 ,  H01J2237/0815 ,  H01J2237/31749

摘要： An inductively coupled plasma source for a focused charged particle beam system includes a dielectric liquid that insulates and cools the plasma chamber. A flow restrictor at an electrical potential that is a large fraction of the plasma potential reducing arcing because the voltage drop in the gas occurs primarily at relative high pressure.

摘要翻译： 用于聚焦带电粒子束系统的电感耦合等离子体源包括绝缘和冷却等离子体室的电介质液体。 由于气体中的电压降主要发生在相对较高的压力下，电流下的流量限制器是等离子体电位降低电弧的大部分。

公开(公告)号：US20150318140A1

公开(公告)日：2015-11-05

申请号：US14710205

申请日：2015-05-12

申请人： FEI Company

发明人： Noel Smith ,  Clive D. Chandler ,  Mark W. Utlaut ,  Paul P. Tesch ,  David William Tuggle

IPC分类号： H01J37/08 ,  H01J37/30

CPC分类号： H01J37/3007 ,  C23C14/0031 ,  C23C14/221 ,  H01J27/16 ,  H01J37/08 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3178 ,  H01J37/32082 ,  H01J37/3211 ,  H01J2237/006 ,  H01J2237/0817 ,  H01J2237/0827 ,  H01J2237/31 ,  H01J2237/31749

摘要： The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.

摘要翻译： 本发明提供了一种等离子体离子束系统，其包括多个气体源，并且可用于使用不同离子种类进行多个操作以产生或改变工件的亚微米特征。 该系统优选使用电感耦合的磁增强离子束源，其适合与探针形成光学源结合以产生各种离子的离子束，而不会由源引起的实质动能振荡，从而允许形成高分辨率 光束。

公开(公告)号：US09129770B2

公开(公告)日：2015-09-08

申请号：US13830401

申请日：2013-03-14

申请人： Schlumberger Technology Corporation

发明人： Luke Perkins ,  Benjamin Levitt ,  Peter Wraight ,  Arthur D. Liberman

IPC分类号： G21G4/02 ,  H01J27/02 ,  H01J27/16 ,  H01J27/20

CPC分类号： H01J27/205 ,  G21G4/02 ,  H01J27/02 ,  H01J27/08 ,  H01J27/16

摘要： An ion source for use in a radiation generator includes a sealed envelope containing an ionizable gas therein. The ion source also includes a RF antenna external to the sealed envelope, the RF antenna to transmit time-varying electromagnetic fields within the sealed envelope for producing ions from the ionizable gas. There is at least one extractor within the sealed envelope having a potential such that the ions are attracted toward the at least one extractor.

摘要翻译： 用于辐射发生器的离子源包括其中含有可电离气体的密封外壳。 离子源还包括在密封外壳外部的RF天线，RF天线用于传输密封外壳内的时变电磁场，用于从可电离气体产生离子。 密封外壳内有至少一个提取器具有使得离子被吸引到至少一个提取器的电位。