Abstract:
Strippers for removal of organic films and deposits, such as polymeric etch resists employed in the manufacture of semiconductors and microcircuits, comprising a surface active agent, phenol or acetic acid, phenol sulfonic acid and chlorinated hydrocarbon.
Abstract:
Acid nickel plating bath for obtaining bright nickel deposits, said bath being of the chloride, sulfate, fluoborate or sulfamate type and containing a brightener mixture comprising the disodium salt of methylene bis naphthalene sulfonic acid and a second component selected from coumarin, piperonal bisulfite complex, sodium beta-styrene sulfonate, benzimidazole and mixtures thereof, with the proviso that benzimidazole is used only when greater than 50 mole percent of nickel salt used in the bath is nickel fluoborate.
Abstract:
An acidic zinc electroplating bath comprising zinc fluoborate dissolved in an aqueous liquid containing as an iron- and metal oxide-deposition inhibitor a small effective amount of a mixture of a 4-hydroxy-, 4-alkyl- or aryl-, 5-acyl- or aroyl-piperidine and thiourea or N-substituted derivative thereof. The invention also includes an improved process for zinc-electroplating ferrous metals from such bath.