公开(公告)号：US11387071B2

公开(公告)日：2022-07-12

申请号：US16733299

申请日：2020-01-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Qiwei Liang ,  Srinivas D Nemani ,  Ellie Yieh ,  Douglas Buchberger ,  Chentsau Chris Ying

IPC: H01J37/09 ,  H01J37/305 ,  H01J37/20 ,  H01J37/30

Abstract: Apparatus for a multi-source ion beam etching (IBE) system are provided herein. In some embodiments, a multi-source IBE system includes a multi-source lid comprising a multi-source adaptor and a lower chamber adaptor, a plurality of IBE sources coupled to the multi-source adaptor, a rotary shield assembly coupled to a shield motor mechanism configured to rotate the rotary shield, wherein the shield motor mechanism is coupled to a top portion of the multi-source lid, and wherein the rotary shield includes a body that has one IBE source opening formed through the body, and at least one beam conduit that engages the one IBE source opening in the rotary shield on one end, and engages the bottom portion of the IBE sources on the opposite end of the beam conduit.

公开(公告)号：US20210104374A1

公开(公告)日：2021-04-08

申请号：US16733299

申请日：2020-01-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Qiwei Liang ,  Srinivas D. Nemani ,  Ellie Yieh ,  Douglas Buchberger ,  Chentsau Chris Ying

IPC: H01J37/09 ,  H01J37/305 ,  H01J37/20

Abstract: Apparatus for a multi-source ion beam etching (IBE) system are provided herein. In some embodiments, a multi-source IBE system includes a multi-source lid comprising a multi-source adaptor and a lower chamber adaptor, a plurality of IBE sources coupled to the multi-source adaptor, a rotary shield assembly coupled to a shield motor mechanism configured to rotate the rotary shield, wherein the shield motor mechanism is coupled to a top portion of the multi-source lid, and wherein the rotary shield includes a body that has one IBE source opening formed through the body, and at least one beam conduit that engages the one IBE source opening in the rotary shield on one end, and engages the bottom portion of the IBE sources on the opposite end of the beam conduit.

公开(公告)号：US20240234108A1

公开(公告)日：2024-07-11

申请号：US18403982

申请日：2024-01-04

Applicant: Applied Materials, Inc.

Inventor： Paneendra Prakash Bhat ,  Qiwei Liang ,  Douglas Buchberger ,  Dmitry Lubomirsky ,  Naveen Kumar Nagaraja ,  Vijay D. Parkhe

IPC: H01J37/32 ,  G03F7/00 ,  G03F7/38 ,  H01L21/683

CPC classification number: H01J37/32724 ,  G03F7/38 ,  G03F7/70708 ,  H01J37/32642 ,  H01L21/6833 ,  H01J2237/002 ,  H01J2237/2007

Abstract: Exemplary substrate support assemblies may include an electrostatic chuck body defining a substrate support surface that defines a substrate seat. The electrostatic chuck body may define a backside gas lumen that extends through a surface of the substrate seat. The assemblies may include a bias electrode coupled with the electrostatic chuck body. The bias electrode may include a plurality of conductive mesas that protrude upward across the substrate seat. The assemblies may include a support stem coupled with the electrostatic chuck body. The assemblies may include at least one chucking electrode embedded within the electrostatic chuck body. The assemblies may include at least one heater embedded within the electrostatic chuck body.