公开(公告)号：US20140020837A1

公开(公告)日：2014-01-23

申请号：US13666280

申请日：2012-11-01

Applicant: APPLIED MATERIALS, INC.

Inventor： ANDREW NGUYEN ,  KENNETH S. COLLINS ,  KARTIK RAMASWAMY ,  SHAHID RAUF ,  JAMES D. CARDUCCI ,  DOUGLAS A. BUCHBERGER, JR. ,  ANKUR AGARWAL ,  JASON A. KENNEY ,  LEONID DORF ,  AJIT BALAKRISHNA ,  RICHARD FOVELL

IPC: B01J12/00

CPC classification number: C23F1/08 ,  B01J12/002 ,  C23C14/28 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32733 ,  H01J37/32834 ,  H05H1/46

Abstract: A plasma reactor enclosure has a metallic portion and a dielectric portion of plural dielectric windows supported on the metallic portion, each of the dielectric windows extending around an axis of symmetry. Plural concentric coil antennas are disposed on an external side of the enclosure, respective ones of the coil antennas facing respective ones of the dielectric windows.

Abstract translation: 等离子体反应器外壳具有支撑在金属部分上的多个介电窗口的金属部分和电介质部分，每个电介质窗口围绕对称轴延伸。 多个同心线圈天线设置在外壳的外侧，相应的线圈天线面对相应的电介质窗口。

公开(公告)号：US20140020836A1

公开(公告)日：2014-01-23

申请号：US13666245

申请日：2012-11-01

Applicant: APPLIED MATERIALS, INC.

Inventor： ANDREW NGUYEN ,  KENNETH S. COLLINS ,  KARTIK RAMASWAMY ,  SHAHID RAUF ,  JAMES D. CARDUCCI ,  DOUGLAS A. BUCHBERGER, JR. ,  ANKUR AGARWAL ,  JASON A. KENNEY ,  LEONID DORF ,  AJIT BALAKRISHNA ,  RICHARD FOVELL

IPC: H05H1/46

CPC classification number: C23F1/08 ,  B01J12/002 ,  C23C14/28 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32733 ,  H01J37/32834 ,  H05H1/46

Abstract: A plasma reactor for processing a workplace includes a reactor chamber having a ceiling and a sidewali and a workplace support facing the ceiling and defining a processing region, and a pair of concentric independently excited RF coil antennas overlying the ceiling and a side RF coil concentric with the side wall and facing the side wall below the ceiling, and being excited independently.

Abstract translation: 用于处理工作场所的等离子体反应器包括具有天花板和侧瓦的反应室，以及面向天花板的工作台支架，并且限定了处理区域，以及一对重叠在天花板上的同心独立激发的RF线圈天线和与RF 侧壁并面向天花板下方的侧壁，并独立激发。