公开(公告)号：US20130180963A1

公开(公告)日：2013-07-18

申请号：US13732621

申请日：2013-01-02

Applicant: APPLIED MATERIALS, INC.

Inventor： CHUNLEI ZHANG ,  RICHARD FOVELL ,  EZRA ROBERT GOLD ,  AJIT BALAKRISHNA ,  JAMES P. CRUSE

IPC: H05B7/18 ,  H01L21/67

CPC classification number: H05B7/18 ,  H01J37/32724 ,  H01J2237/2001 ,  H01L21/67069

Abstract: Methods and apparatus for regulating the temperature of a component in a plasma-enhanced process chamber are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber and an RF source to provide RF energy to form a plasma in the process chamber. A component is disposed in the process chamber so as to be heated by the plasma when formed. A heater is configured to heat the component and a heat exchanger is configured to remove heat from the component. A chiller is coupled to the heat exchanger via a first flow conduit having an on/off flow control valve disposed therein and a bypass loop to bypass the flow control valve, wherein the bypass loop has a flow ratio valve disposed therein.

Abstract translation: 本文提供了用于调节等离子体增强处理室中的组分的温度的方法和装置。 在一些实施例中，用于处理衬底的装置包括处理室和RF源，以提供RF能量以在处理室中形成等离子体。 一个部件设置在处理室中，以便在形成时被等离子体加热。 加热器被配置为加热部件并且热交换器被配置成从部件移除热量。 冷却器通过具有设置在其中的开/关流量控制阀的第一流动管道和旁路循环来耦合到热交换器，旁路回路绕过流量控制阀，其中旁路回路具有设置在其中的流量比阀。

公开(公告)号：US20140020837A1

公开(公告)日：2014-01-23

申请号：US13666280

申请日：2012-11-01

Applicant: APPLIED MATERIALS, INC.

Inventor： ANDREW NGUYEN ,  KENNETH S. COLLINS ,  KARTIK RAMASWAMY ,  SHAHID RAUF ,  JAMES D. CARDUCCI ,  DOUGLAS A. BUCHBERGER, JR. ,  ANKUR AGARWAL ,  JASON A. KENNEY ,  LEONID DORF ,  AJIT BALAKRISHNA ,  RICHARD FOVELL

IPC: B01J12/00

CPC classification number: C23F1/08 ,  B01J12/002 ,  C23C14/28 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32733 ,  H01J37/32834 ,  H05H1/46

Abstract: A plasma reactor enclosure has a metallic portion and a dielectric portion of plural dielectric windows supported on the metallic portion, each of the dielectric windows extending around an axis of symmetry. Plural concentric coil antennas are disposed on an external side of the enclosure, respective ones of the coil antennas facing respective ones of the dielectric windows.

Abstract translation: 等离子体反应器外壳具有支撑在金属部分上的多个介电窗口的金属部分和电介质部分，每个电介质窗口围绕对称轴延伸。 多个同心线圈天线设置在外壳的外侧，相应的线圈天线面对相应的电介质窗口。

公开(公告)号：US20140020836A1

公开(公告)日：2014-01-23

申请号：US13666245

申请日：2012-11-01

Applicant: APPLIED MATERIALS, INC.

Inventor： ANDREW NGUYEN ,  KENNETH S. COLLINS ,  KARTIK RAMASWAMY ,  SHAHID RAUF ,  JAMES D. CARDUCCI ,  DOUGLAS A. BUCHBERGER, JR. ,  ANKUR AGARWAL ,  JASON A. KENNEY ,  LEONID DORF ,  AJIT BALAKRISHNA ,  RICHARD FOVELL

IPC: H05H1/46

CPC classification number: C23F1/08 ,  B01J12/002 ,  C23C14/28 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32733 ,  H01J37/32834 ,  H05H1/46

Abstract: A plasma reactor for processing a workplace includes a reactor chamber having a ceiling and a sidewali and a workplace support facing the ceiling and defining a processing region, and a pair of concentric independently excited RF coil antennas overlying the ceiling and a side RF coil concentric with the side wall and facing the side wall below the ceiling, and being excited independently.

Abstract translation: 用于处理工作场所的等离子体反应器包括具有天花板和侧瓦的反应室，以及面向天花板的工作台支架，并且限定了处理区域，以及一对重叠在天花板上的同心独立激发的RF线圈天线和与RF 侧壁并面向天花板下方的侧壁，并独立激发。