公开(公告)号：US20140020836A1

公开(公告)日：2014-01-23

申请号：US13666245

申请日：2012-11-01

Applicant: APPLIED MATERIALS, INC.

Inventor： ANDREW NGUYEN ,  KENNETH S. COLLINS ,  KARTIK RAMASWAMY ,  SHAHID RAUF ,  JAMES D. CARDUCCI ,  DOUGLAS A. BUCHBERGER, JR. ,  ANKUR AGARWAL ,  JASON A. KENNEY ,  LEONID DORF ,  AJIT BALAKRISHNA ,  RICHARD FOVELL

IPC: H05H1/46

CPC classification number: C23F1/08 ,  B01J12/002 ,  C23C14/28 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32733 ,  H01J37/32834 ,  H05H1/46

Abstract: A plasma reactor for processing a workplace includes a reactor chamber having a ceiling and a sidewali and a workplace support facing the ceiling and defining a processing region, and a pair of concentric independently excited RF coil antennas overlying the ceiling and a side RF coil concentric with the side wall and facing the side wall below the ceiling, and being excited independently.

Abstract translation: 用于处理工作场所的等离子体反应器包括具有天花板和侧瓦的反应室，以及面向天花板的工作台支架，并且限定了处理区域，以及一对重叠在天花板上的同心独立激发的RF线圈天线和与RF 侧壁并面向天花板下方的侧壁，并独立激发。

公开(公告)号：US20140262032A1

公开(公告)日：2014-09-18

申请号：US14202472

申请日：2014-03-10

Applicant: APPLIED MATERIALS, INC

Inventor： KENNETH S. COLLINS ,  SATORU KOBAYASHI ,  KARTIK RAMASWAMY

IPC: H03L7/085

CPC classification number: H03L7/1075

Abstract: Methods and apparatus for generating a variable clock used to control a component of a substrate processing system are provided herein. In some embodiments, an apparatus for controlling a substrate processing system includes: a phase locked loop circuit for generating a relative clock that is phase locked to a variable frequency signal being used by a substrate processing chamber; and a controller, coupled to the phase locked loop circuit, for producing a control signal for a component of the substrate processing system, wherein the control signal is based upon the relative clock and an operating indicia of the substrate processing system.

Abstract translation: 本文提供了用于生成用于控制基板处理系统的部件的可变时钟的方法和装置。 在一些实施例中，一种用于控制衬底处理系统的装置包括：锁相环电路，用于产生相位锁定到由衬底处理室使用的可变频率信号的相对时钟; 以及耦合到所述锁相环电路的用于产生所述衬底处理系统的部件的控制信号的控制器，其中所述控制信号基于所述衬底处理系统的相对时钟和操作标记。

公开(公告)号：US20140020837A1

公开(公告)日：2014-01-23

申请号：US13666280

申请日：2012-11-01

Applicant: APPLIED MATERIALS, INC.

Inventor： ANDREW NGUYEN ,  KENNETH S. COLLINS ,  KARTIK RAMASWAMY ,  SHAHID RAUF ,  JAMES D. CARDUCCI ,  DOUGLAS A. BUCHBERGER, JR. ,  ANKUR AGARWAL ,  JASON A. KENNEY ,  LEONID DORF ,  AJIT BALAKRISHNA ,  RICHARD FOVELL

IPC: B01J12/00

CPC classification number: C23F1/08 ,  B01J12/002 ,  C23C14/28 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32733 ,  H01J37/32834 ,  H05H1/46

Abstract: A plasma reactor enclosure has a metallic portion and a dielectric portion of plural dielectric windows supported on the metallic portion, each of the dielectric windows extending around an axis of symmetry. Plural concentric coil antennas are disposed on an external side of the enclosure, respective ones of the coil antennas facing respective ones of the dielectric windows.

Abstract translation: 等离子体反应器外壳具有支撑在金属部分上的多个介电窗口的金属部分和电介质部分，每个电介质窗口围绕对称轴延伸。 多个同心线圈天线设置在外壳的外侧，相应的线圈天线面对相应的电介质窗口。