公开(公告)号：US20160027616A1

公开(公告)日：2016-01-28

申请号：US14341492

申请日：2014-07-25

Applicant: APPLIED MATERIALS, INC.

Inventor： KARTIK RAMASWAMY ,  YANG YANG ,  STEVEN LANE ,  LAWRENCE WONG ,  JOSEPH F. AUBUCHON ,  TRAVIS KOH

IPC: H01J37/32 ,  H01L21/67 ,  H01J37/244

CPC classification number: H01J37/32165 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32174

Abstract: Spatial distribution of RF power delivered to plasma in a processing chamber is controlled using an arrangement of primary and secondary inductors, wherein the current through the secondary inductors affects the spatial distribution of the plasma. The secondary inductors are configured to resonate at respectively different frequencies. A first secondary inductor is selectively excited to resonance, during a first time period within a duty cycle, by delivering power to a primary inductor at the resonant frequency of the first secondary inductor. A second secondary inductor is selectively excited to resonance, during a second time period within a duty cycle, by delivering power to a primary inductor at the resonant frequency of the second secondary inductor. The secondary inductors are isolated from one another and terminated such that substantially all current that passes through them and into the plasma results from mutual inductance with a primary inductor.

Abstract translation: 使用初级和次级电感器的布置来控制传送到处理室中的等离子体的RF功率的空间分布，其中通过次级电感器的电流影响等离子体的空间分布。 次级电感器被配置为分别在不同的频率下谐振。 通过在第一次级电感器的谐振频率处向初级电感器输送功率，在占空比的第一时间段期间，选择性地激励第一次级电感器进行谐振。 通过在第二次级电感器的谐振频率处向初级电感器输送功率，在占空比的第二时间周期期间，选择性地激励第二次级电感器进行谐振。 次级电感器彼此隔离并且端接，使得通过它们并进入等离子体的基本上所有的电流源于与初级电感器的互感。

公开(公告)号：US20140196849A1

公开(公告)日：2014-07-17

申请号：US13833220

申请日：2013-03-15

Applicant: APPLIED MATERIALS, INC.

Inventor： ANDREW NGUYEN ,  KARTIK RAMASWAMY ,  YANG YANG ,  STEVEN LANE

IPC: B29C35/02

CPC classification number: H01J37/321 ,  H01J37/3211

Abstract: Embodiments of methods and apparatus for plasma processing are provided herein. In some embodiments, an inductively coupled plasma apparatus may include a bottom wall comprising a hub and a ring coupled to the hub by a capacitor, wherein the hub and the ring are each electrically conductive, and where the hub has a central opening aligned with a central axis of the inductively coupled plasma apparatus; a top wall spaced apart from and above the bottom wall, wherein the top wall has a central opening aligned with the central axis, and wherein the tope wall is electrically conductive; a sidewall electrically connecting the ring to the top wall; and a tube electrically connecting the hub to the top wall, the tube having a central opening aligned with the central axis.

Abstract translation: 本文提供了等离子体处理的方法和装置的实施例。 在一些实施例中，电感耦合等离子体装置可以包括底壁，其包括毂和通过电容器联接到毂的环，其中所述毂和环各自是导电的，并且其中所述毂具有与 感应耦合等离子体装置的中心轴; 与所述底壁间隔开的顶壁，其中所述顶壁具有与所述中心轴线对准的中心开口，并且其中所述顶壁是导电的; 将所述环电连接到所述顶壁的侧壁; 以及将轮毂电连接到顶壁的管，该管具有与中心轴对准的中心开口。

公开(公告)号：US20170162365A1

公开(公告)日：2017-06-08

申请号：US15437757

申请日：2017-02-21

Applicant: APPLIED MATERIALS, INC.

Inventor： STEVEN LANE ,  TZA-JING GUNG ,  KARTIK RAMASWAMY ,  TRAVIS KOH ,  JOSEPH F. AUBUCHON ,  YANG YANG

IPC: H01J37/32

CPC classification number: H01J37/3211 ,  H01J37/32669

Abstract: Methods and apparatus for controlling a magnetic field in a plasma chamber are provided herein. In some embodiments, a process chamber liner may include a cylindrical body, an inner electromagnetic cosine-theta (cos θ) coil ring including a first plurality of inner coils embedded in the body and configured to generate a magnetic field in a first direction, and an outer electromagnetic cosine-theta (cos θ) coil ring including a second plurality of outer coils embedded in the body and configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos θ coil ring is disposed concentrically about the inner electromagnetic cos θ coil ring.

公开(公告)号：US20160027613A1

公开(公告)日：2016-01-28

申请号：US14339990

申请日：2014-07-24

Applicant: APPLIED MATERIALS, INC.

Inventor： STEVEN LANE ,  TZA-JING GUNG ,  KARTIK RAMASWAMY ,  TRAVIS KOH ,  JOSEPH F. AUBUCHON ,  YANG YANG

IPC: H01J37/32 ,  H01L21/67 ,  H01J37/147

CPC classification number: H01J37/3211 ,  H01J37/32669

Abstract: Methods and apparatus for controlling a magnetic field in a plasma chamber are provided herein. In some embodiments, a process chamber liner may include a cylindrical body, an inner electromagnetic cosine-theta (cos θ) coil ring including a first plurality of inner coils embedded in the body and configured to generate a magnetic field in a first direction, and an outer electromagnetic cosine-theta (cos θ) coil ring including a second plurality of outer coils embedded in the body and configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos θ coil ring is disposed concentrically about the inner electromagnetic cos θ coil ring.

Abstract translation: 本文提供了用于控制等离子体室中的磁场的方法和装置。 在一些实施例中，处理室衬套可以包括圆柱形主体，内部电磁余弦-θ（cos＆amp; thetas））线圈，其包括嵌入在主体中并被配置为在第一方向上产生磁场的第一多个内部线圈， 以及外部电磁余弦-θ（cos＆amp;θ）线圈，其包括嵌入在所述主体中的第二多个外部线圈，并被配置为在与所述第一方向正交的第二方向上产生磁场，其中所述外部电磁场和所述外部电磁场; 线圈环围绕内部电磁场和心轴同心放置; 线圈环