公开(公告)号：US20160027616A1

公开(公告)日：2016-01-28

申请号：US14341492

申请日：2014-07-25

Applicant: APPLIED MATERIALS, INC.

Inventor： KARTIK RAMASWAMY ,  YANG YANG ,  STEVEN LANE ,  LAWRENCE WONG ,  JOSEPH F. AUBUCHON ,  TRAVIS KOH

IPC: H01J37/32 ,  H01L21/67 ,  H01J37/244

CPC classification number: H01J37/32165 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32174

Abstract: Spatial distribution of RF power delivered to plasma in a processing chamber is controlled using an arrangement of primary and secondary inductors, wherein the current through the secondary inductors affects the spatial distribution of the plasma. The secondary inductors are configured to resonate at respectively different frequencies. A first secondary inductor is selectively excited to resonance, during a first time period within a duty cycle, by delivering power to a primary inductor at the resonant frequency of the first secondary inductor. A second secondary inductor is selectively excited to resonance, during a second time period within a duty cycle, by delivering power to a primary inductor at the resonant frequency of the second secondary inductor. The secondary inductors are isolated from one another and terminated such that substantially all current that passes through them and into the plasma results from mutual inductance with a primary inductor.

Abstract translation: 使用初级和次级电感器的布置来控制传送到处理室中的等离子体的RF功率的空间分布，其中通过次级电感器的电流影响等离子体的空间分布。 次级电感器被配置为分别在不同的频率下谐振。 通过在第一次级电感器的谐振频率处向初级电感器输送功率，在占空比的第一时间段期间，选择性地激励第一次级电感器进行谐振。 通过在第二次级电感器的谐振频率处向初级电感器输送功率，在占空比的第二时间周期期间，选择性地激励第二次级电感器进行谐振。 次级电感器彼此隔离并且端接，使得通过它们并进入等离子体的基本上所有的电流源于与初级电感器的互感。

公开(公告)号：US20150087157A1

公开(公告)日：2015-03-26

申请号：US14491729

申请日：2014-09-19

Applicant: APPLIED MATERIALS, INC.

Inventor： JOSEPH F. AUBUCHON ,  TZA-JING GUNG ,  SAMER BANNA

IPC: H01L21/67 ,  H01L21/3065

CPC classification number: H01L21/3065 ,  H01J37/3211 ,  H01J37/32669

Abstract: Methods and apparatus for plasma-enhanced substrate processing are provided herein. In some embodiments, an apparatus for processing a substrate includes: a process chamber having an internal processing volume disposed beneath a dielectric lid of the process chamber; a substrate support disposed in the process chamber; two or more concentric inductive coils disposed above the dielectric lid to inductively couple RF energy into the processing volume above the substrate support; and an electromagnetic dipole disposed proximate a top surface of the dielectric lid between two adjacent concentric inductive coils of the two or more concentric inductive coils.

Abstract translation: 本文提供了等离子体增强基板处理的方法和装置。 在一些实施例中，用于处理衬底的装置包括：处理室，其具有设置在处理室的电介质盖下方的内部处理容积; 设置在所述处理室中的基板支撑件; 设置在电介质盖上方的两个或更多个同心感应线圈将RF能量感应耦合到衬底支架上方的处理容积中; 以及设置在所述两个或更多个同心电感线圈的两个相邻同心电感线圈之间的电介质盖的顶表面附近的电磁偶极子。

公开(公告)号：US20170162365A1

公开(公告)日：2017-06-08

申请号：US15437757

申请日：2017-02-21

Applicant: APPLIED MATERIALS, INC.

Inventor： STEVEN LANE ,  TZA-JING GUNG ,  KARTIK RAMASWAMY ,  TRAVIS KOH ,  JOSEPH F. AUBUCHON ,  YANG YANG

IPC: H01J37/32

CPC classification number: H01J37/3211 ,  H01J37/32669

Abstract: Methods and apparatus for controlling a magnetic field in a plasma chamber are provided herein. In some embodiments, a process chamber liner may include a cylindrical body, an inner electromagnetic cosine-theta (cos θ) coil ring including a first plurality of inner coils embedded in the body and configured to generate a magnetic field in a first direction, and an outer electromagnetic cosine-theta (cos θ) coil ring including a second plurality of outer coils embedded in the body and configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos θ coil ring is disposed concentrically about the inner electromagnetic cos θ coil ring.

公开(公告)号：US20160027613A1

公开(公告)日：2016-01-28

申请号：US14339990

申请日：2014-07-24

Applicant: APPLIED MATERIALS, INC.

Inventor： STEVEN LANE ,  TZA-JING GUNG ,  KARTIK RAMASWAMY ,  TRAVIS KOH ,  JOSEPH F. AUBUCHON ,  YANG YANG

IPC: H01J37/32 ,  H01L21/67 ,  H01J37/147

CPC classification number: H01J37/3211 ,  H01J37/32669

Abstract: Methods and apparatus for controlling a magnetic field in a plasma chamber are provided herein. In some embodiments, a process chamber liner may include a cylindrical body, an inner electromagnetic cosine-theta (cos θ) coil ring including a first plurality of inner coils embedded in the body and configured to generate a magnetic field in a first direction, and an outer electromagnetic cosine-theta (cos θ) coil ring including a second plurality of outer coils embedded in the body and configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos θ coil ring is disposed concentrically about the inner electromagnetic cos θ coil ring.

Abstract translation: 本文提供了用于控制等离子体室中的磁场的方法和装置。 在一些实施例中，处理室衬套可以包括圆柱形主体，内部电磁余弦-θ（cos＆amp; thetas））线圈，其包括嵌入在主体中并被配置为在第一方向上产生磁场的第一多个内部线圈， 以及外部电磁余弦-θ（cos＆amp;θ）线圈，其包括嵌入在所述主体中的第二多个外部线圈，并被配置为在与所述第一方向正交的第二方向上产生磁场，其中所述外部电磁场和所述外部电磁场; 线圈环围绕内部电磁场和心轴同心放置; 线圈环