公开(公告)号：US20160116518A1

公开(公告)日：2016-04-28

申请号：US14924954

申请日：2015-10-28

Applicant: APPLIED MATERIALS, INC.

Inventor： HAITAO WANG ,  LAWRENCE WONG ,  KARTIK RAMASWAMY ,  CHUNLEI ZHANG

IPC: G01R29/24 ,  H01L21/683

CPC classification number: G01R29/24 ,  H01L21/67253 ,  H01L21/6833

Abstract: Methods and apparatus for measurement of a surface charge profile of an electrostatic chuck are provided herein. In some embodiments, an apparatus for measurement of a surface charge profile of an electrostatic chuck includes: an electrostatic charge sensor disposed on a substrate to obtain data indicative of an electrostatic charge on an electrostatic chuck; and a transmitter disposed on the substrate and having an input in communication with an output of the electrostatic charge sensor to transmit the data.

Abstract translation: 本文提供了用于测量静电卡盘的表面电荷分布的方法和装置。 在一些实施例中，用于测量静电卡盘的表面电荷分布的装置包括：静电电荷传感器，设置在基板上以获得指示静电卡盘上的静电电荷的数据; 以及发射器，其布置在所述衬底上并且具有与所述静电电荷传感器的输出端相通的输入端以传输所述数据。

公开(公告)号：US20160027616A1

公开(公告)日：2016-01-28

申请号：US14341492

申请日：2014-07-25

Applicant: APPLIED MATERIALS, INC.

Inventor： KARTIK RAMASWAMY ,  YANG YANG ,  STEVEN LANE ,  LAWRENCE WONG ,  JOSEPH F. AUBUCHON ,  TRAVIS KOH

IPC: H01J37/32 ,  H01L21/67 ,  H01J37/244

CPC classification number: H01J37/32165 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32174

Abstract: Spatial distribution of RF power delivered to plasma in a processing chamber is controlled using an arrangement of primary and secondary inductors, wherein the current through the secondary inductors affects the spatial distribution of the plasma. The secondary inductors are configured to resonate at respectively different frequencies. A first secondary inductor is selectively excited to resonance, during a first time period within a duty cycle, by delivering power to a primary inductor at the resonant frequency of the first secondary inductor. A second secondary inductor is selectively excited to resonance, during a second time period within a duty cycle, by delivering power to a primary inductor at the resonant frequency of the second secondary inductor. The secondary inductors are isolated from one another and terminated such that substantially all current that passes through them and into the plasma results from mutual inductance with a primary inductor.

Abstract translation: 使用初级和次级电感器的布置来控制传送到处理室中的等离子体的RF功率的空间分布，其中通过次级电感器的电流影响等离子体的空间分布。 次级电感器被配置为分别在不同的频率下谐振。 通过在第一次级电感器的谐振频率处向初级电感器输送功率，在占空比的第一时间段期间，选择性地激励第一次级电感器进行谐振。 通过在第二次级电感器的谐振频率处向初级电感器输送功率，在占空比的第二时间周期期间，选择性地激励第二次级电感器进行谐振。 次级电感器彼此隔离并且端接，使得通过它们并进入等离子体的基本上所有的电流源于与初级电感器的互感。