SUBSTRATE WITH ANTIREFLECTION LAYER
    1.
    发明申请
    SUBSTRATE WITH ANTIREFLECTION LAYER 审中-公开
    带抗反射层的基板

    公开(公告)号:US20160025899A1

    公开(公告)日:2016-01-28

    申请号:US14878054

    申请日:2015-10-08

    Abstract: The present invention provides a substrate with an antireflection layer not only which is excellent in the antireflection properties but also which has high water repellency and oil repellency and favorable oil and fat stain removability, and a display device provided with a substrate with an antireflection layer.A substrate with an antireflection layer, which comprises an antireflection layer on at least one surface of the substrate, wherein the antireflection layer contains a silica porous film having fluorinated organic groups, and the surface of the antireflection layer on the opposite side from the substrate has an element number ratio F/Si of at least 1 as obtained from the peak height of F1s and the peak height of Si2p in surface analysis by scanning X-ray photoelectron spectroscopy (ESCA) and has an arithmetic mean roughness (Sa) of at most 3.0 nm.

    Abstract translation: 本发明提供一种具有抗反射层的基板,不仅具有优异的防反射性,而且具有高拒水性和拒油性以及良好的油脂污渍除去性,以及具有防反射层的基板的显示装置。 具有抗反射层的基板,其在基板的至少一个表面上包括抗反射层,其中防反射层包含具有氟化有机基团的二氧化硅多孔膜,并且与基板相反侧的抗反射层的表面具有 通过扫描X射线光电子能谱(ESCA)从表面分析中获得的F1s的峰高和Si2p的峰高度得到的至少为1的元素数比F / Si和算术平均粗糙度(Sa)最多 3.0nm。

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