Method for texturing a glass surface
    4.
    发明授权
    Method for texturing a glass surface 有权
    玻璃表面纹理化方法

    公开(公告)号:US09302933B2

    公开(公告)日:2016-04-05

    申请号:US13900659

    申请日:2013-05-23

    Abstract: A method of making an article having a textured glass surface, including, for example: attaching microencapsulated particles to a portion of a glass surface of the article; and contacting the glass surface having the attached microencapsulated particles with an etchant to form the textured surface. A glass article prepared by the method including: at least one textured surface having excellent haze, distinctness-of-image, surface roughness, and uniformity properties, as defined herein.A display system that incorporates the glass article, as defined herein, is also disclosed.

    Abstract translation: 一种制造具有纹理化玻璃表面的制品的方法,包括例如:将微囊化颗粒附着到制品的玻璃表面的一部分; 并将具有附着的微胶囊化颗粒的玻璃表面与蚀刻剂接触以形成纹理表面。 通过该方法制备的玻璃制品包括:如本文所定义的至少一个纹理表面,其具有优异的雾度,明显的图像,表面粗糙度和均匀性。 还公开了包含如本文所定义的玻璃制品的显示系统。

    SUBSTRATE WITH ANTIREFLECTION LAYER
    5.
    发明申请
    SUBSTRATE WITH ANTIREFLECTION LAYER 审中-公开
    带抗反射层的基板

    公开(公告)号:US20160025899A1

    公开(公告)日:2016-01-28

    申请号:US14878054

    申请日:2015-10-08

    Abstract: The present invention provides a substrate with an antireflection layer not only which is excellent in the antireflection properties but also which has high water repellency and oil repellency and favorable oil and fat stain removability, and a display device provided with a substrate with an antireflection layer.A substrate with an antireflection layer, which comprises an antireflection layer on at least one surface of the substrate, wherein the antireflection layer contains a silica porous film having fluorinated organic groups, and the surface of the antireflection layer on the opposite side from the substrate has an element number ratio F/Si of at least 1 as obtained from the peak height of F1s and the peak height of Si2p in surface analysis by scanning X-ray photoelectron spectroscopy (ESCA) and has an arithmetic mean roughness (Sa) of at most 3.0 nm.

    Abstract translation: 本发明提供一种具有抗反射层的基板,不仅具有优异的防反射性,而且具有高拒水性和拒油性以及良好的油脂污渍除去性,以及具有防反射层的基板的显示装置。 具有抗反射层的基板,其在基板的至少一个表面上包括抗反射层,其中防反射层包含具有氟化有机基团的二氧化硅多孔膜,并且与基板相反侧的抗反射层的表面具有 通过扫描X射线光电子能谱(ESCA)从表面分析中获得的F1s的峰高和Si2p的峰高度得到的至少为1的元素数比F / Si和算术平均粗糙度(Sa)最多 3.0nm。

    Three-dimensional nanostructures and method for fabricating the same
    6.
    发明授权
    Three-dimensional nanostructures and method for fabricating the same 有权
    三维纳米结构及其制造方法

    公开(公告)号:US09180519B2

    公开(公告)日:2015-11-10

    申请号:US14511992

    申请日:2014-10-10

    Abstract: A three-dimensional nanostructures and a method for fabricating the same, and more particularly to three-dimensional structures of various shapes having high aspect ratio and uniformity in large area and a method of fabricating the same by attaching a target material to the outer surface of patterned polymer structures using an ion bombardment phenomenon occurring during a physical ion etching process to form target material-polymer composite structures, and then removing the polymer from the target material-polymer structures. A three-dimensional nanostructures with high aspect ratio and uniformity can be fabricated by a simple process at low cost by using the ion bombardment phenomenon occurring during physical ion etching. Also, nanostructures of various shapes can be easily fabricated by controlling the pattern and shape of polymer structures. In addition, uniform fine nanostructures having a thickness of 10 nm or less can be formed in a large area.

    Abstract translation: 一种三维纳米结构及其制造方法,更具体地涉及具有高纵横比和大面积均匀性的各种形状的三维结构及其制造方法,其目的是将目标材料附着到 使用在物理离子蚀刻工艺期间发生的离子轰击现象形成靶材料 - 聚合物复合结构,然后从目标材料 - 聚合物结构中除去聚合物的图案化聚合物结构。 通过使用在物理离子蚀刻期间发生的离子轰击现象,可以通过简单的方法以低成本制造具有高纵横比和均匀性的三维纳米结构。 此外,通过控制聚合物结构的图案和形状,可以容易地制造各种形状的纳米结构。 此外,可以大面积地形成厚度为10nm以下的均匀的微细纳米结构体。

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