Substrate provided with antireflection films and its production method
    1.
    发明申请
    Substrate provided with antireflection films and its production method 失效
    基片提供防反射膜及其制作方法

    公开(公告)号:US20020051294A1

    公开(公告)日:2002-05-02

    申请号:US09912362

    申请日:2001-07-26

    Abstract: It is to provide a substrate provided with antireflection films, which is excellent in antireflection properties to incident light at an oblique angle from the film face side, which has a high transmittance and with which the reflection color tone does not tend to be bluish. A substrate provided with antireflection films, which comprises a transparent substrate and at least two antireflection film layers deposited on one side of the transparent substrate, wherein the reflectance on the film face of light incident at an angle of incidence of 5null from the film face side is at most 6% at the entire wavelength region ranging from 400 to 480 nm.

    Abstract translation: 本发明提供一种具有防反射膜的基板,其对于具有高透射率并且反射色调不趋向蓝色的与膜面侧倾斜的入射光的抗反射性优异。 提供有防反射膜的基板,其包括透明基板和沉积在透明基板的一侧上的至少两个防反射膜层,其中以与膜面成5°入射角入射的光的反射率 在400〜480nm范围内的整个波长范围内,至多为6%以下。

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