SUBSTRATE PROCESSING DEVICE
    1.
    发明申请

    公开(公告)号:US20190035647A1

    公开(公告)日:2019-01-31

    申请号:US16039938

    申请日:2018-07-19

    Abstract: Provided is a substrate-processing device capable of preventing a top lid from sagging downward by the own weight of the substrate-processing device and/or a vacuum suction force generated by a vacuum pump and/or thermal shock at high temperature process, in a chamber including a plurality of reactors. Also, provided is a rotating shaft for transferring a substrate between the plurality of reactors.

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