公开(公告)号：US20200056286A1

公开(公告)日：2020-02-20

申请号：US16598768

申请日：2019-10-10

Applicant: ASM IP HOLDING, B.V.

Inventor： Eric James Shero ,  Mohith E. Verghese ,  Carl Louis White ,  Herbert Terhorst ,  Dan Maurice

IPC: C23C16/455 ,  H01L21/02

Abstract: A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.

公开(公告)号：US20160289828A1

公开(公告)日：2016-10-06

申请号：US15182504

申请日：2016-06-14

Applicant: ASM IP HOLDING, B.V.

Inventor： Eric James Shero ,  Mohith E. Verghese ,  Carl Louis White ,  Herbert Terhorst ,  Dan Mourice

IPC: C23C16/455 ,  H01L21/02

CPC classification number: C23C16/45502 ,  C23C16/45504 ,  C23C16/45525 ,  C23C16/45544 ,  C23C16/45561 ,  C23C16/45591 ,  H01L21/0228 ,  Y10T137/85938

Abstract: A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.

Abstract translation: 一种具有壳体的反应器，其包围可操作地连接到反应室和排气组件的气体输送系统。 气体输送系统包括用于向反应室提供至少一种处理气体的多条气体管线。 气体输送系统还包括用于接收至少一种处理气体的混合器。 混合器可操作地连接到被配置成扩散工艺气体的扩散器。 扩散器直接附接到反应室的上表面，从而在它们之间形成扩散体。 扩散器包括至少一个分配表面，该分配表面被配置为当工艺气体在被引入反应室之前通过扩散器体积时向流化气体提供流量限制。

公开(公告)号：US10556799B2

公开(公告)日：2020-02-11

申请号：US16049524

申请日：2018-07-30

Applicant: ASM IP HOLDING B.V.

Inventor： Eric J. Shero ,  Mohith E. Verghese

IPC: C01B32/921 ,  C23C16/32 ,  C23C16/455 ,  C23C16/18

Abstract: Aluminum (Al) hydrocarbon precursor compositions are provided that can be used for vapor deposition of transition metal carbide thin films, for example aluminum-doped transition metal carbide thin films such as Al-doped titanium carbide thin films. In some embodiments, the precursor compositions comprise one or more isomers of tritertbutyl aluminum (TTBA). In some embodiments the precursor compositions comprise at least 50% of Isomer 1 of TTBA, at least 50% of Isomer 2 of TTBA, or at least 20% of a combination of Isomer 1 and Isomer 2, where Isomer 1 has the formula Al(tert-Bu)2(iso-Bu) and Isomer 2 has the formula Al(tert-Bu)(iso-Bu)2. A container containing a precursor composition comprising at least 50% of Isomer 1 or Isomer 2 or at least 20% of a combination of Isomer 1 and 2 of TTBA can be attached to a vapor deposition reactor and used to deposit transition metal carbide thin films such as Al-doped titanium carbide thin films by atomic layer deposition or chemical vapor deposition.

公开(公告)号：US20180339907A1

公开(公告)日：2018-11-29

申请号：US16049524

申请日：2018-07-30

Applicant: ASM IP HOLDING B.V.

Inventor： Eric J. Shero ,  Mohith E. Verghese

IPC: C01B32/921 ,  C23C16/32 ,  C23C16/455

CPC classification number: C01B32/921 ,  C23C16/32 ,  C23C16/45525

Abstract: Aluminum (Al) hydrocarbon precursor compositions are provided that can be used for vapor deposition of transition metal carbide thin films, for example aluminum-doped transition metal carbide thin films such as Al-doped titanium carbide thin films. In some embodiments, the precursor compositions comprise one or more isomers of tritertbutyl aluminum (TTBA). In some embodiments the precursor compositions comprise at least 50% of Isomer 1 of TTBA, at least 50% of Isomer 2 of TTBA, or at least 20% of a combination of Isomer 1 and Isomer 2, where Isomer 1 has the formula Al(tert-Bu)2(iso-Bu) and Isomer 2 has the formula Al(tert-Bu)(iso-Bu)2. A container containing a precursor composition comprising at least 50% of Isomer 1 or Isomer 2 or at least 20% of a combination of Isomer 1 and 2 of TTBA can be attached to a vapor deposition reactor and used to deposit transition metal carbide thin films such as Al-doped titanium carbide thin films by atomic layer deposition or chemical vapor deposition.

公开(公告)号：US20230383402A1

公开(公告)日：2023-11-30

申请号：US18233065

申请日：2023-08-11

Applicant: ASM IP Holding B.V.

Inventor： Eric James Shero ,  Carl Louis White ,  Mohith E. Verghese ,  Kyle Fondurulia ,  Timothy James Sullivan

IPC: C23C16/448 ,  H01L21/67

CPC classification number: C23C16/4485 ,  H01L21/67115 ,  H01L21/67103 ,  H01L21/67098

Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.

公开(公告)号：US20170096345A1

公开(公告)日：2017-04-06

申请号：US15239389

申请日：2016-08-17

Applicant: ASM IP HOLDING B.V.

Inventor： Eric J. Shero ,  Mohith E. Verghese

IPC: C01B31/30 ,  C23C16/32

CPC classification number: C23C16/32 ,  C01B32/921 ,  C23C16/45525

Abstract: Aluminum (Al) hydrocarbon precursor compositions are provided that can be used for vapor deposition of transition metal carbide thin films, for example aluminum-doped transition metal carbide thin films such as Al-doped titanium carbide thin films. In some embodiments, the precursor compositions comprise one or more isomers of tritertbutyl aluminum (TTBA). In some embodiments the precursor compositions comprise at least 50% of Isomer 1 of TTBA, at least 50% of Isomer 2 of TTBA, or at least 20% of a combination of Isomer 1 and Isomer 2, where Isomer 1 has the formula Al(tert-Bu)2(iso-Bu) and Isomer 2 has the formula Al(tert-Bu)(iso-Bu)2. A container containing a precursor composition comprising at least 50% of Isomer 1 or Isomer 2 or at least 20% of a combination of Isomer 1 and 2 of TTBA can be attached to a vapor deposition reactor and used to deposit transition metal carbide thin films such as Al-doped titanium carbide thin films by atomic layer deposition or chemical vapor deposition.

公开(公告)号：US20230313370A1

公开(公告)日：2023-10-05

申请号：US18332627

申请日：2023-06-09

Applicant: ASM IP HOLDING B.V.

Inventor： Eric James Shero ,  Carl Louis White ,  Mohith E. Verghese ,  Kyle Fondurulia ,  Timothy James Sullivan

IPC: C23C16/448 ,  H01L21/67

CPC classification number: C23C16/4485 ,  H01L21/67098 ,  H01L21/67103 ,  H01L21/67115

Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.

公开(公告)号：US11773486B2

公开(公告)日：2023-10-03

申请号：US18163144

申请日：2023-02-01

Applicant: ASM IP HOLDING B.V.

Inventor： Eric James Shero ,  Carl Louis White ,  Mohith E. Verghese ,  Kyle Fondurulia ,  Timothy James Sullivan

IPC: H01L21/67 ,  C23C16/448

CPC classification number: C23C16/4485 ,  H01L21/67098 ,  H01L21/67103 ,  H01L21/67115

Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.

公开(公告)号：US20230183861A1

公开(公告)日：2023-06-15

申请号：US18163144

申请日：2023-02-01

Applicant: ASM IP HOLDING B.V.

Inventor： Eric James Shero ,  Carl Louis White ,  Mohith E. Verghese ,  Kyle Fondurulia ,  Timothy James Sullivan

IPC: C23C16/448 ,  H01L21/67

CPC classification number: C23C16/4485 ,  H01L21/67098 ,  H01L21/67103 ,  H01L21/67115

Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.

公开(公告)号：US10480072B2

公开(公告)日：2019-11-19

申请号：US15182504

申请日：2016-06-14

Applicant: ASM IP HOLDING, B.V.

Inventor： Eric James Shero ,  Mohith E. Verghese ,  Carl Louis White ,  Herbert Terhorst ,  Dan Maurice

IPC: C23C16/455 ,  H01L21/02

Abstract: A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.