公开(公告)号：US20140253891A1

公开(公告)日：2014-09-11

申请号：US14281346

申请日：2014-05-19

申请人： ASML Holding N.V. ,  ASML Netherlands B.V.

发明人： Arie Jeffrey DEN BOEF ,  Earl William EBERT, JR. ,  Harry SEWELL ,  Keith William ANDRESEN ,  Sanjeev Kumar SINGH

IPC分类号： G03F7/20 ,  G02F1/11

CPC分类号： G03F7/70141 ,  G01B11/14 ,  G02F1/116 ,  G03F7/70191 ,  G03F9/7065

摘要： A lithographic apparatus comprises an alignment system including a tunable narrow pass-band filter configured to receive a broad-band radiation and to filter the broad-band radiation into narrow-band linearly polarized radiation. The tunable narrow pass-band filter is further configured to modulate an intensity and wavelength of the narrow-band radiation and to provide a plurality of pass-band filters at a same time or nearly the same time. The alignment system further includes a relay and mechanical interface configured to receive the narrow-band radiation and to adjust a profile of the narrow-band radiation based on physical properties of alignment targets on a substrate. The adjusted narrow-band radiation is focused on the alignment targets using a focusing system.

摘要翻译： 光刻设备包括对准系统，其包括被配置为接收宽带辐射并将宽带辐射过滤成窄带线偏振辐射的可调谐窄带通滤波器。 可调谐窄带通滤波器还被配置为调制窄带辐射的强度和波长并且在同时或几乎同时提供多个通带滤波器。 对准系统还包括被配置为接收窄带辐射并基于衬底上的对准靶的物理特性来调整窄带辐射的轮廓的继电器和机械接口。 使用聚焦系统将经调整的窄带辐射聚焦在对准目标上。

公开(公告)号：US20130258316A1

公开(公告)日：2013-10-03

申请号：US13898973

申请日：2013-05-21

申请人： ASML Holding N.V.

发明人： Arie Jeffrey DEN BOEF ,  Earl William EBERT ,  Harry SEWELL ,  Keith William ANDRESEN ,  Sanjeev Kumar SINGH

IPC分类号： G01B11/14 ,  G03F7/20

CPC分类号： G03F7/70141 ,  G01B11/14 ,  G02F1/116 ,  G03F7/70191 ,  G03F9/7065

摘要： A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.

摘要翻译： 光刻设备具有对准系统，其包括被配置为将窄带辐射转换成连续，平坦和宽带辐射的辐射源。 声可调窄带通滤波器将宽带辐射滤波成窄带线偏振辐射。 窄带辐射可以聚焦在晶片的对准目标上，以便能够对准晶片。 在一个实施例中，滤波器被配置为调制由辐射源产生的辐射的强度和波长并且具有多个同时的通带。 辐射源产生具有高空间相干性和低时间相干性的辐射。