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公开(公告)号：US20220397833A1
公开(公告)日：2022-12-15
申请号：US17633884
申请日：2020-08-05
发明人： Franciscus Godefridus Casper BIJNEN , Muhsin ERALP , Simon Reinald HUISMAN , Arie Jeffrey DEN BOEF
IPC分类号： G03F9/00
摘要： An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a self-referencing Interferometer configured to generate two diffraction sub-beams, wherein the two diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment apparatus further includes a beam analyzer configured to generate interference between the overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches, and a detection system configured to determine a position of the alignment target based on light intensity measurement of the optical branches, wherein the measured light intensity is temporally modulated by a phase modulator.
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公开(公告)号：US20160223920A1
公开(公告)日：2016-08-04
申请号：US15023075
申请日：2014-09-11
发明人： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Justin Lloyd KREUZER , Simon Gijsbert Josephus MATHIJSSEN
CPC分类号： G03F9/7069 , G01B9/02011 , G01B9/02015 , G01B11/272 , G01B2290/70 , G03F9/7049 , G03F9/7088
摘要： Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.
摘要翻译： 装置，系统和方法用于使用偏振无关干涉仪来检测基板上特征的对准。 该装置，系统和方法包括从基板上的标记衍射或散射的光的光学元件。 光学元件可以将衍射光分成由一个或多个检测器检测的多个子光束。 衍射光可以在光学上或在检测后的处理期间组合。 该系统可以基于接收到的具有任何偏振角或状态的衍射光来确定对准和/或覆盖。
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公开(公告)号：US20170160075A1
公开(公告)日：2017-06-08
申请号：US15439833
申请日：2017-02-22
CPC分类号： G01B11/14 , F25D3/06 , F25D11/003 , F25D23/006 , G01B9/0207 , G03F7/70108 , G03F9/7069 , G03F9/7084 , G03F9/7088
摘要： An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). An illumination arrangement (940, 962, 964) provides off-axis radiation from at least first and second regions. The first and second source regions are diametrically opposite one another with respect to an optical axis (O) and are limited in angular extent. The regions may be small spots selected according to a direction of periodicity of a mark being measured, or larger segments. Radiation at a selected pair of source regions can be generated by supplying radiation at a single source feed position to a self-referencing interferometer. A modified half wave plate is positioned downstream of the interferometer, which can be used in the position measuring apparatus. The modified half wave plate has its fast axis in one part arranged at 45° to the fast axis in another part diametrically opposite.
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公开(公告)号：US20140253891A1
公开(公告)日：2014-09-11
申请号：US14281346
申请日：2014-05-19
发明人： Arie Jeffrey DEN BOEF , Earl William EBERT, JR. , Harry SEWELL , Keith William ANDRESEN , Sanjeev Kumar SINGH
CPC分类号： G03F7/70141 , G01B11/14 , G02F1/116 , G03F7/70191 , G03F9/7065
摘要： A lithographic apparatus comprises an alignment system including a tunable narrow pass-band filter configured to receive a broad-band radiation and to filter the broad-band radiation into narrow-band linearly polarized radiation. The tunable narrow pass-band filter is further configured to modulate an intensity and wavelength of the narrow-band radiation and to provide a plurality of pass-band filters at a same time or nearly the same time. The alignment system further includes a relay and mechanical interface configured to receive the narrow-band radiation and to adjust a profile of the narrow-band radiation based on physical properties of alignment targets on a substrate. The adjusted narrow-band radiation is focused on the alignment targets using a focusing system.
摘要翻译： 光刻设备包括对准系统，其包括被配置为接收宽带辐射并将宽带辐射过滤成窄带线偏振辐射的可调谐窄带通滤波器。 可调谐窄带通滤波器还被配置为调制窄带辐射的强度和波长并且在同时或几乎同时提供多个通带滤波器。 对准系统还包括被配置为接收窄带辐射并基于衬底上的对准靶的物理特性来调整窄带辐射的轮廓的继电器和机械接口。 使用聚焦系统将经调整的窄带辐射聚焦在对准目标上。
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公开(公告)号：US20220342228A1
公开(公告)日：2022-10-27
申请号：US17764057
申请日：2020-09-27
摘要： A system includes a radiation source and a phased array. The phased array includes optical elements, waveguides and phase modulators. The phased array generates a beam of radiation. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves accumulate to form the beam. An amount of incoherence of the beam is based on randomization of the phases.
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公开(公告)号：US20220283516A1
公开(公告)日：2022-09-08
申请号：US17637942
申请日：2020-08-05
摘要： A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.
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公开(公告)号：US20170212434A1
公开(公告)日：2017-07-27
申请号：US15328194
申请日：2015-07-07
发明人： Simon Gijsbert Josephus MATHIJSSEN , Arie Jeffrey DEN BOEF , Justin Lloyd KREUZER , Patricius Aloysius Jacobus TINNEMANS
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7065 , G03F9/7069
摘要： An alignment sensor for a lithographic apparatus is arranged and constructed to measure an alignment of a movable part of the lithographic apparatus in respect of a stationary part of the lithographic apparatus. The alignment sensor comprises a light source configured to generate a pulse train at a optical wavelength and a pulse repetition frequency, a non-linear optical element, arranged in an optical propagation path of the pulse train, the non-linear optical element configured to transform the pulse train at the optical wavelength into a transformed pulse train in an optical wavelength range, an optical imaging system configured to project the transformed pulse train onto an alignment mark comprising a diffraction grating; a detector to detect a diffraction pattern as diffracted by the diffraction grating, and a data processing device configured to derive alignment data from the detected diffraction pattern as detected by the detector.
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公开(公告)号：US20230044632A1
公开(公告)日：2023-02-09
申请号：US17787244
申请日：2020-10-21
发明人： Willem Marie Julia Marcel COENE , Arie Jeffrey DEN BOEF , Vasco Tomas TENNER , Nitesh PANDEY , Christos MESSINIS , Johannes Fitzgerald DE BOER
摘要： A dark field digital holographic microscope is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope comprises an illumination device configured to provide at least: a first beam pair comprising a first illumination beam of radiation (1010) and a first reference beam of radiation (1030) and a second beam pair comprising a second illumination beam of radiation (1020) and a second reference beam of radiation (1040); and one or more optical elements (1070) operable to capture a first scattered radiation and to capture a second scattered radiation scattered by the structure resultant from the first and second illumination beams respectively. The beams of the first beam pair are mutually coherent and the beams of the second beam pair are mutually coherent. The illumination device is configured to impose incoherence (ADI) between the first beam pair and second beam pair.
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公开(公告)号：US20210356873A1
公开(公告)日：2021-11-18
申请号：US17277583
申请日：2019-09-19
IPC分类号： G03F7/20
摘要： A method to measure a parameter of a manufacturing process, the method including illuminating a target with radiation, detecting scattered radiation from the target, and determining the parameter of interest from an asymmetry of the detected radiation.
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公开(公告)号：US20210208083A1
公开(公告)日：2021-07-08
申请号：US17192276
申请日：2021-03-04
发明人： Arie Jeffrey DEN BOEF , Amo Jan BLEEKER , Youri Johannes VAN DOMMELEN , Mircea DUSA , Antoine Gaston Marie KIERS , Paul Frank LUEHRMANN , Henricus Petrus Maria PELLEMANS , Maurits VAN DER SCHAAR , Cédric Désiré GROUWSTRA , Markus Geradus Maritinus VAN KRAAIJ
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
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