公开(公告)号：US20220082949A1

公开(公告)日：2022-03-17

申请号：US17423325

申请日：2020-01-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Arnaud HUBAUX ,  Johan Franciscus Maria BECKERS ,  Dylan John David DAVIES ,  Johan Gertrudis Cornelis KUNNEN ,  Willem Richard PONGERS ,  Ajinkya Ravindra DAWARE ,  Chung-Hsun LI ,  Georgios TSIROGIANNIS ,  Hendrik Cornelis Anton BORGER ,  Frederik Eduard DEJONG ,  Juan Manuel GONZALEZ HUESCA ,  Andriy HLOD ,  Maxim PISARENCO

IPC: G03F7/20 ,  G03F1/70 ,  G06F30/392

Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.