公开(公告)号：US20230252347A1

公开(公告)日：2023-08-10

申请号：US18015162

申请日：2021-07-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Eleftherios KOULIERAKIS ,  Carlo LANCIA ,  Juan Manuel GONZALEZ HUESCA ,  Alexander YPMA

IPC: G06N20/00 ,  G03F7/00 ,  G03F7/20

CPC classification number: G06N20/00 ,  G03F7/706841 ,  G03F7/70516 ,  G03F7/705

Abstract: Method and apparatus for adapting a distribution model of a machine learning fabric. The distribution model is for mitigating the effect of concept drift, and is configured to provide an output as input to a functional model of the machine learning fabric. The functional model is for performing a machine learning task. The method may include obtaining a first data point, and providing the first data point as input to one or more distribution monitoring components of the distribution model. The one or more distribution monitoring components have been trained on a plurality of further data points. A metric representing a correspondence between the first data point and the plurality of further data points is determined, by at least one of the one or more distribution monitoring components. Based on the error metric, the output of the distribution model is adapted.

公开(公告)号：US20220082949A1

公开(公告)日：2022-03-17

申请号：US17423325

申请日：2020-01-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Arnaud HUBAUX ,  Johan Franciscus Maria BECKERS ,  Dylan John David DAVIES ,  Johan Gertrudis Cornelis KUNNEN ,  Willem Richard PONGERS ,  Ajinkya Ravindra DAWARE ,  Chung-Hsun LI ,  Georgios TSIROGIANNIS ,  Hendrik Cornelis Anton BORGER ,  Frederik Eduard DEJONG ,  Juan Manuel GONZALEZ HUESCA ,  Andriy HLOD ,  Maxim PISARENCO

IPC: G03F7/20 ,  G03F1/70 ,  G06F30/392

Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.

公开(公告)号：US20230273529A1

公开(公告)日：2023-08-31

申请号：US18012222

申请日：2021-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Satej Subhash KHEDEKAR ,  Henricus Jozef CASTELIJNS ,  Anjan Prasad GANTAPARA ,  Stephen Henry BOND ,  Seyed Iman MOSSAVAT ,  Alexander YPMA ,  Gerald DICKER ,  Ewout Klaas STEINMEIER ,  Chaoqun GUO ,  Chenxi LIN ,  Hongwei CHEN ,  Zhaoze LI ,  Youping ZHANG ,  Yi ZOU ,  Koos VAN BERKEL ,  Joost Johan BOLDER ,  Arnaud HUBAUX ,  Andriy Vasyliovich HLOD ,  Juan Manuel GONZALEZ HUESCA ,  Frans Bernard AARDEN

IPC: G03F7/20

CPC classification number: G03F7/70525 ,  G03F7/70633 ,  G03F7/7065

Abstract: Generating a control output for a patterning process is described. A control input is received. The control input is for controlling the patterning process. The control input includes one or more parameters used in the patterning process. The control output is generated with a trained machine learning mod& based on the control input, The machine learning model is trained with training data generated from simulation of the patterning process and/or actual process data, The training data includes 1) a plurality of training control inputs corresponding to a plurality of operational conditions of the patterning process, where the plurality of operational conditions of the patterning process are associated with operational condition specific behavior of the patterning process over time, and 2) training control outputs generated using a physical model based on the training control inputs.

公开(公告)号：US20230058166A1

公开(公告)日：2023-02-23

申请号：US17910454

申请日：2021-03-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Eleftherios KOULIERAKIS ,  Carlo LANCIA ,  Juan Manuel GONZALEZ HUESCA ,  Alexander YPMA ,  Dimitra GKOROU ,  Reza SAHRAEIAN

IPC: G03F7/20

Abstract: A method for determining an inspection strategy for at least one substrate, the method including: quantifying, using a prediction model, a compliance metric value for a compliance metric relating to a prediction of compliance with a quality requirement based on one or both of pre-processing data associated with the substrate and any available post-processing data associated with the at least one substrate; and deciding on an inspection strategy for the at least one substrate, based on the compliance metric value, an expected cost associated with the inspection strategy and at least one objective value describing an expected value of the inspection strategy in terms of at least one objective relating to the prediction model.