公开(公告)号：US20170023871A1

公开(公告)日：2017-01-26

申请号：US15287547

申请日：2016-10-06

申请人： ASML NETHERLANDS B.V.

发明人： Helmar VAN SANTEN ,  Aleksey KOLESNYCHENKO

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

摘要翻译： 公开了一种用于浸没式光刻投影装置的液体供应系统，其中在投影系统，阻挡构件和基板之间限定空间。 阻挡构件不被密封，使得在使用期间，允许浸没液体流出空间以及阻挡构件和基底之间。

公开(公告)号：US20190265596A1

公开(公告)日：2019-08-29

申请号：US16286885

申请日：2019-02-27

申请人： ASML NETHERLANDS B.V.

发明人： Joeri LOF ,  Antonius Theodorus Anna Maria DERKSEN ,  Christiaan Alexander HOOGENDAM ,  Aleksey KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Theodorus Marinus MODDERMAN ,  Johannes Catharinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Helmar VAN SANTEN

IPC分类号： G03F7/20 ,  G03F9/00

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

公开(公告)号：US20170255111A1

公开(公告)日：2017-09-07

申请号：US15599811

申请日：2017-05-19

申请人： ASML NETHERLANDS B.V.

发明人： Helmar VAN SANTEN ,  Aleksey KOLESNYCHENKO

IPC分类号： G03F7/20 ,  G03F7/00

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

公开(公告)号：US20150362844A1

公开(公告)日：2015-12-17

申请号：US14743775

申请日：2015-06-18

申请人： ASML NETHERLANDS B.V.

发明人： Joeri LOF ,  Antonius Theodorus Anna Maria DERKSEN ,  Christiaan Alexander HOOGENDAM ,  Aleksey KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Theodorus Marinus MODDERMAN ,  Johannes Catharinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Helmar VAN SANTEN

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。