公开(公告)号：US20190265596A1

公开(公告)日：2019-08-29

申请号：US16286885

申请日：2019-02-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Antonius Theodorus Anna Maria DERKSEN ,  Christiaan Alexander HOOGENDAM ,  Aleksey KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Theodorus Marinus MODDERMAN ,  Johannes Catharinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Helmar VAN SANTEN

IPC: G03F7/20 ,  G03F9/00

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

公开(公告)号：US20170023871A1

公开(公告)日：2017-01-26

申请号：US15287547

申请日：2016-10-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Helmar VAN SANTEN ,  Aleksey KOLESNYCHENKO

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract translation: 公开了一种用于浸没式光刻投影装置的液体供应系统，其中在投影系统，阻挡构件和基板之间限定空间。 阻挡构件不被密封，使得在使用期间，允许浸没液体流出空间以及阻挡构件和基底之间。

公开(公告)号：US20170255111A1

公开(公告)日：2017-09-07

申请号：US15599811

申请日：2017-05-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Helmar VAN SANTEN ,  Aleksey KOLESNYCHENKO

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

公开(公告)号：US20150362844A1

公开(公告)日：2015-12-17

申请号：US14743775

申请日：2015-06-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Antonius Theodorus Anna Maria DERKSEN ,  Christiaan Alexander HOOGENDAM ,  Aleksey KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Theodorus Marinus MODDERMAN ,  Johannes Catharinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Helmar VAN SANTEN

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Abstract translation: 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。