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公开(公告)号：US20180210350A1
公开(公告)日：2018-07-26
申请号：US15320300
申请日：2015-06-04
发明人： Gerben PIETERSE , Theodorus Wilhelmus POLET , Johannes Jacobus Matheus BASELMANS , Willem Jan BOUMAN , Theodorus Marinus MODDERMAN , Cornelius Maria ROPS , Bart SMEETS , Koen STEFFENS , Ronald VAN DER HAM
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70316 , G03F7/70341
摘要： An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.
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公开(公告)号：US20150192864A1
公开(公告)日：2015-07-09
申请号：US14661929
申请日：2015-03-18
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/7075
摘要： A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
摘要翻译： 光刻设备包括：支撑基板的第一工作台; 第二表，不被配置为支撑基板，包括用于感测来自投影系统的图案化的辐射束的特性的传感器单元，所述第二台在第一台从下方移出时在投影系统下方移动 投影系统，在第一和第二表彼此独立地移动; 以及液体供应系统，用于向投影系统和基板，第一台和/或第二台之间的空间供应液体，其中第二台被配置为在液体限制结构的底部提供限制表面 当第一台从投影系统下方移除时，以防止液体泄漏到光刻设备的其余部分中。
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公开(公告)号：US20180059556A1
公开(公告)日：2018-03-01
申请号：US15802429
申请日：2017-11-02
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/7075
摘要： A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
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公开(公告)号：US20170010546A1
公开(公告)日：2017-01-12
申请号：US15216670
申请日：2016-07-21
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/7075
摘要： A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
摘要翻译： 光刻设备包括：支撑基板的第一工作台; 第二表，不被配置为支撑基板，包括用于感测来自投影系统的图案化的辐射束的特性的传感器单元，所述第二台在第一台从下方移出时在投影系统下方移动 投影系统，在第一和第二表彼此独立地移动; 以及液体供应系统，用于向投影系统和基板，第一台和/或第二台之间的空间供应液体，其中第二台被配置为在液体限制结构的底部提供限制表面 当第一台从投影系统下方移除时，以防止液体泄漏到光刻设备的其余部分中。
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公开(公告)号：US20150331334A1
公开(公告)日：2015-11-19
申请号：US14807458
申请日：2015-07-23
发明人： Joannes Theodoor DE SMIT , Vadim Yevgenyevich BANINE , Theodorus Hubertus Josephus BISSCHOPS , Marcel Mathijs Theodore Marie DIERICHS , Theodorus Marinus MODDERMAN
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
摘要翻译： 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。
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公开(公告)号：US20190265596A1
公开(公告)日：2019-08-29
申请号：US16286885
申请日：2019-02-27
发明人： Joeri LOF , Antonius Theodorus Anna Maria DERKSEN , Christiaan Alexander HOOGENDAM , Aleksey KOLESNYCHENKO , Erik Roelof LOOPSTRA , Theodorus Marinus MODDERMAN , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
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公开(公告)号：US20150009479A1
公开(公告)日：2015-01-08
申请号：US14500386
申请日：2014-09-29
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/7075
摘要： A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
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公开(公告)号：US20200341366A1
公开(公告)日：2020-10-29
申请号：US16765339
申请日：2018-11-27
发明人： Derk Servatius Gertruda BROUNS , Joshua ADAMS , Aage BENDIKSEN , Richard JACOBS , Andrew JUDGE , Veera Venkata Narasimha Narendra Phani KOTTAPALLI , Joseph Harry LYONS , Theodorus Marinus MODDERMAN , Manish RANJAN , Marcus Adrianus VAN DE KERKHOF , Xugang XIONG
摘要： An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.
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公开(公告)号：US20170219939A1
公开(公告)日：2017-08-03
申请号：US15328376
申请日：2015-06-26
发明人： Theodorus Wilhelmus POLET , Johannes Jacobus BASELMANS , Willem Jan BOUMAN , Han Henricus Aldegonda LEMPENS , Theodorus Marinus MODDERMAN , Cornelius Maria ROPS , Bart SMEETS , Koen STEFFENS , Ronald VAN DER HAM
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.
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公开(公告)号：US20150362844A1
公开(公告)日：2015-12-17
申请号：US14743775
申请日：2015-06-18
发明人： Joeri LOF , Antonius Theodorus Anna Maria DERKSEN , Christiaan Alexander HOOGENDAM , Aleksey KOLESNYCHENKO , Erik Roelof LOOPSTRA , Theodorus Marinus MODDERMAN , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。
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