公开(公告)号：US20210132513A1

公开(公告)日：2021-05-06

申请号：US17054194

申请日：2019-05-22

申请人： ASML NETHERLANDS B.V.

发明人： Dennis Herman Caspar VAN BANNING ,  Jeroen Gerard GOSEN

IPC分类号： G03F7/20 ,  H01J37/20 ,  H01J37/317

摘要： An apparatus having: a vacuum chamber for enclosing an article support, the article support configured to support an article such that a volume is defined between the article support and the article, the article support including a plurality of supporting protrusions configured to provide a plane of support for the article; a conduit for providing a fluid to the volume such that the fluid provides heat transfer between the article and the article support; and a controller for controlling the fluid supply to the volume, wherein the controller is configured to control a fluid supply unit to start removing the fluid substantially at a time the article reaches a stable temperature.

公开(公告)号：US20230205101A1

公开(公告)日：2023-06-29

申请号：US17927348

申请日：2021-05-27

申请人： ASML NETHERLANDS B.V.

发明人： Luuc KEULEN ,  Jeroen Gerard GOSEN ,  Dennis Herman Caspar VAN BANNING ,  Sampann ARORA ,  Michaél Johannes Christiaan RONDE ,  Lucas KUINDERSMA ,  Youssef Karel Maria DE VOS ,  Henricus Martinus Johannes VAN DE GROES ,  Allard Eelco KOOIKER ,  Wouter Onno PRIL ,  Johan VAN GEND

IPC分类号： G03F7/20

CPC分类号： G03F7/70933 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70883 ,  G03F7/70725

摘要： An apparatus for use in a metrology process or a lithographic process, the apparatus including: an object support module adapted to hold an object; and a first gas shower arranged on a first side of the object support module and adapted to emit a gas with a first velocity in a first gas direction which is a horizontal direction to cause a net gas flow in the apparatus to be a substantially horizontal gas flow in the first gas direction at least above the object support module.

公开(公告)号：US20210272829A1

公开(公告)日：2021-09-02

申请号：US17257900

申请日：2019-06-27

申请人： ASML NETHERLANDS B.V.

发明人： Patriek Adrianus Alphonsus Maria BRUURS ,  Dennis Herman Caspar VAN BANNING ,  Jan-Gerard Cornelis VAN DER TOORN ,  Edwin Cornelis KADIJK

IPC分类号： H01L21/67 ,  H01J37/244 ,  H01J37/20 ,  H01L21/68 ,  G01K11/125 ,  G01K1/14

摘要： A stage apparatus including: an object table configured to hold an object; a positioning device configured to position the object table and the object held by the object table; and a remote temperature sensor configured to measure a temperature of the object table and/or the object, wherein the remote temperature sensor comprises a passive temperature sensing element.