公开(公告)号：US20220028648A1

公开(公告)日：2022-01-27

申请号：US17497761

申请日：2021-10-08

申请人： ASML Netherlands B.V.

发明人： Han Willem Hendrik SEVERT ,  Jan-Gerard Cornelis VAN DER TOORN ,  Ronald VAN DER WILK ,  Allard Eelco KOOIKER

IPC分类号： H01J37/20 ,  H01J37/26 ,  H01J37/28

摘要： A stage apparatus for a particle-beam apparatus is disclosed. A particle beam apparatus may comprise a conductive object and an object table, the object table being configured to support an object. The object table comprises a table body and a conductive coating, the conductive coating being provided on at least a portion of a surface of the table body. The conductive object is disposed proximate to the conductive coating and the table body is provided with a feature proximate to an edge portion of the conductive coating. Said feature is arranged so as to reduce an electric field strength in the vicinity of the edge portion of the conductive coating when a voltage is applied to both the conductive object and the conductive coating.

公开(公告)号：US20230246568A1

公开(公告)日：2023-08-03

申请号：US18132617

申请日：2023-04-10

申请人： ASML Netherlands B.V.

发明人： Jan-Gerard Cornelis VAN DER TOORN ,  Jeroen Gertruda Antonius HUINCK ,  Han Willem Hendrik SEVERT ,  Allard Eelco KOOIKER ,  Michael Johannes Christiaan RONDE ,  Arno Maria WELLINK ,  Shibing LIU ,  Ying LUO ,  Yixiang WANG ,  Chia-Yao CHEN ,  Bohang ZHU ,  Jurgen VAN SOEST

IPC分类号： H02N13/00 ,  G03F7/20

CPC分类号： H02N13/00 ,  G03F7/70708 ,  G03F7/70716

摘要： Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

公开(公告)号：US20210313908A1

公开(公告)日：2021-10-07

申请号：US17351181

申请日：2021-06-17

申请人： ASML Netherlands B.V.

发明人： Jan-Gerard Cornelis VAN DER TOORN ,  Jeroen Gertruda Antonius HUINCK ,  Han Willem Hendrik SEVERT ,  Allard Eelco KOOIKER ,  Michaël Johannes Christiaan RONDE ,  Arno Maria WELLINK ,  Shibing LIU ,  Ying LUO ,  Yixiang WANG ,  Chia-Yao CHEN ,  Bohang ZHU ,  Jurgen VAN SOEST

IPC分类号： H02N13/00 ,  G03F7/20

摘要： Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

公开(公告)号：US20170363964A1

公开(公告)日：2017-12-21

申请号：US15694519

申请日：2017-09-01

申请人： ASML Netherlands B.V.

发明人： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Haico Victor KOK ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Johannes Antonius Maria VAN DE WAL ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Robbert-Jan VOOGD ,  Jan Steven Christiaan WESTERLAKEN ,  Johannes Hubertus Antonius VAN DE RIJDT ,  Allard Eelco KOOIKER ,  Wilhelmina Margareta Jozef HURKENS-MERTENS ,  Yohann Bruno Yvon TEILLET

IPC分类号： G03F7/20

CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/70666 ,  G03F7/70858 ,  G03F7/70891

摘要： A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.

公开(公告)号：US20230205101A1

公开(公告)日：2023-06-29

申请号：US17927348

申请日：2021-05-27

申请人： ASML NETHERLANDS B.V.

发明人： Luuc KEULEN ,  Jeroen Gerard GOSEN ,  Dennis Herman Caspar VAN BANNING ,  Sampann ARORA ,  Michaél Johannes Christiaan RONDE ,  Lucas KUINDERSMA ,  Youssef Karel Maria DE VOS ,  Henricus Martinus Johannes VAN DE GROES ,  Allard Eelco KOOIKER ,  Wouter Onno PRIL ,  Johan VAN GEND

IPC分类号： G03F7/20

CPC分类号： G03F7/70933 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70883 ,  G03F7/70725

摘要： An apparatus for use in a metrology process or a lithographic process, the apparatus including: an object support module adapted to hold an object; and a first gas shower arranged on a first side of the object support module and adapted to emit a gas with a first velocity in a first gas direction which is a horizontal direction to cause a net gas flow in the apparatus to be a substantially horizontal gas flow in the first gas direction at least above the object support module.

公开(公告)号：US20170343390A1

公开(公告)日：2017-11-30

申请号：US15524263

申请日：2015-10-22

申请人： ASML NETHERLANDS B.V.

发明人： Wouter Onno PRIL ,  Jan Peter BAARTMAN ,  Allard Eelco KOOIKER ,  Suzanne Johanna, Antonetta, COSIJNS ,  Bryan TONG-MINH

IPC分类号： G01D5/38 ,  G01B9/02 ,  G01B11/02 ,  G03F7/20

摘要： An encoder includes an optical component and an enclosing device having a first surface portion and a second surface portion. The first surface portion is arranged to receive from an ambient environment a first radiation beam. The second surface portion is arranged to receive from the ambient environment a second radiation beam. The optical component is arranged to combine the first and second radiation beams. The enclosing device is arranged to propagate the first radiation beam along a first path. The first path is between the first surface portion and the optical component. The enclosing device is arranged to propagate the second radiation beam along a second path. The second path is between the second surface portion and the optical component. The enclosing device is arranged to enclose a space, so as to isolate the first path and the second path from the ambient environment.