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公开(公告)号：US10585363B2
公开(公告)日：2020-03-10
申请号：US15575069
申请日：2016-03-14
发明人： Simon Gijsbert Josephus Mathijssen , Arie Jeffrey Den Boef , Alessandro Polo , Patricius Aloysius Jacobus Tinnemans , Adrianus Johannes Hendrikus Schellekens , Elahe Yeganegi Dastgerdi , Willem Marie Julia Marcel Coene , Erik Willem Bogaart , Simon Reinald Huisman
摘要： An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.
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2.发明申请公开(公告)号：US20200379358A1
公开(公告)日：2020-12-03
申请号：US16999140
申请日：2020-08-21
发明人： Erik Willem Bogaart
摘要： A lithographic apparatus includes a number of sensors for measuring positions of features on a substrate prior to applying a pattern. Each sensor includes an imaging optical system. Position measurements are extracted from pixel data supplied by an image detector in each sensor. The imaging optical system includes one or more light field modulating elements and the processor processes the pixel data as a light-field image to extract the position measurements. The data processor may derive from each light-field image a focused image of a feature on the substrate, measuring positions of several features simultaneously, even though the substrate is not at the same level below all the sensors. The processor can also include corrections to reduce depth dependency of an apparent position of the feature include a viewpoint correction. The data processor can also derive measurements of heights of features on the substrate.
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3.发明授权公开(公告)号：US09835954B2
公开(公告)日：2017-12-05
申请号：US14892880
申请日：2014-05-02
发明人： Erik Willem Bogaart , Franciscus Godefridus Casper Bijnen , Arie Jeffrey Den Boef , Simon Gijsbert Josephus Mathijssen
IPC分类号： G03F7/00 , G01N21/95 , G03F7/20 , G01N21/956 , G01N21/65
CPC分类号： G03F7/70483 , G01N21/9501 , G01N21/956 , G01N2021/656 , G03F7/70625
摘要： A substrate is provided with device structures and metrology structures (800). The device structures include materials exhibiting inelastic scattering of excitation radiation of one or more wavelengths. The device structures include structures small enough in one or more dimensions that the characteristics of the inelastic scattering are influenced significantly by quantum confinement. The metrology structures (800) include device-like structures (800b) similar in composition and dimensions to the device features, and calibration structures (800a). The calibration structures are similar to the device features in composition but different in at least one dimension. Using an inspection apparatus and method implementing Raman spectroscopy, the dimensions of the device-like structures can be measured by comparing spectral features of radiation scattered inelastically from the device-like structure and the calibration structure.
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4.发明申请METHOD AND APPARATUS FOR MEASURING ASYMMETRY OF A MICROSTRUCTURE, POSITION MEASURING METHOD, POSITION MEASURING APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权用于测量微结构不对称的方法和装置，位置测量方法，位置测量装置，平面设备和装置制造方法公开(公告)号：US20150176979A1
公开(公告)日：2015-06-25
申请号：US14421434
申请日：2013-07-17
发明人： Simon Gijsbert Josephus Mathijssen , Erik Willem Bogaart , Patricius Aloysius Jacobus Tinnemans , Arie Jeffrey Den Boef
CPC分类号： G01B11/14 , G01B9/02 , G01B11/27 , G03F7/70058 , G03F7/70625 , G03F7/70633 , G03F9/7069 , G03F9/7088
摘要： A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of an alignment target comprising a periodic structure. An illumination optical system for focusing radiation into a spot on said structure. An asymmetry detection optical system receives a share of positive and negative orders of radiation diffracted by the periodic structure, and forms first and second images of said spot on first and second detectors respectively, wherein said negative order radiation is used to form the first image and said positive order radiation is used to form the second image. A processor for processing together signals from said first and second detectors representing intensities of said positive and negative orders to produce a measurement of asymmetry in the periodic structure. The asymmetry measurement can be used to improve accuracy of the position read by the alignment sensor.
摘要翻译： 光刻设备包括对准传感器，其包括用于读取包括周期性结构的对准目标位置的自参考干涉仪。 一种照明光学系统，用于将辐射聚焦到所述结构上的光斑中。 不对称检测光学系统接收通过周期性结构衍射的辐射的正数和负数的共享，并分别在第一和第二检测器上形成所述光斑的第一和第二图像，其中所述负序辐射用于形成第一图像， 所述正阶辐射用于形成第二图像。 用于处理来自所述第一和第二检测器的信号的处理器，其表示所述正序和负序的强度，以产生周期性结构中的不对称性的测量。 可以使用不对称测量来提高由对准传感器读取的位置的精度。
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公开(公告)号：US11169447B2
公开(公告)日：2021-11-09
申请号：US16999140
申请日：2020-08-21
发明人： Erik Willem Bogaart
摘要： A lithographic apparatus includes a number of sensors for measuring positions of features on a substrate prior to applying a pattern. Each sensor includes an imaging optical system. Position measurements are extracted from pixel data supplied by an image detector in each sensor. The imaging optical system includes one or more light field modulating elements and the processor processes the pixel data as a light-field image to extract the position measurements. The data processor may derive from each light-field image a focused image of a feature on the substrate, measuring positions of several features simultaneously, even though the substrate is not at the same level below all the sensors. The processor can also include corrections to reduce depth dependency of an apparent position of the feature include a viewpoint correction. The data processor can also derive measurements of heights of features on the substrate.
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公开(公告)号：US10558129B2
公开(公告)日：2020-02-11
申请号：US15526654
申请日：2015-11-16
发明人： Matthias Kruizinga , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Erik Willem Bogaart , Derk Servatius Gertruda Brouns , Marc Bruijn , Richard Joseph Bruls , Jeroen Dekkers , Paul Janssen , Mohammad Reza Kamali , Ronald Harm Gunther Kramer , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Matthew Lipson , Erik Roelof Loopstra , Joseph H. Lyons , Stephen Roux , Gerrit Van Den Bosch , Sander Van Den Heijkant , Sandra Van Der Graaf , Frits Van Der Meulen , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：US11009803B2
公开(公告)日：2021-05-18
申请号：US16587483
申请日：2019-09-30
发明人： Matthias Kruizinga , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Erik Willem Bogaart , Derk Servatius Gertruda Brouns , Marc Bruijn , Richard Joseph Bruls , Jeroen Dekkers , Paul Janssen , Mohammad Reza Kamali , Ronald Harm Gunther Kramer , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Matthew Lipson , Erik Roelof Loopstra , Joseph H. Lyons , Stephen Roux , Gerrit Van Den Bosch , Sander Van Den Heijkant , Sandra Van Der Graaf , Frits Van Der Meulen , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：US10042260B2
公开(公告)日：2018-08-07
申请号：US15508543
申请日：2015-08-11
摘要： Capacitive measurements for monitoring vapor or deposits from a vapor in a radiation source for a lithography apparatus. The measurements may be used to control operation of the radiation source. In one particular arrangement measurements from a plurality of capacitors are used to distinguish between changes in capacitance caused by the vapor and changes in capacitance caused by deposits from the vapor.
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公开(公告)号：US09983485B2
公开(公告)日：2018-05-29
申请号：US15325048
申请日：2015-06-09
发明人： Erik Willem Bogaart
CPC分类号： G03F7/70525 , G03F7/70508 , G03F7/70633 , G03F9/7026 , G03F9/7034 , G03F9/7088
摘要： A lithographic apparatus includes a number of sensors for measuring positions of features on a substrate prior to applying a pattern. Each sensor includes an imaging optical system. Position measurements are extracted from pixel data supplied by an image detector in each sensor. The imaging optical system includes one or more light field modulating elements and the processor processes the pixel data as a light-field image to extract the position measurements. The data processor may derive from each light-field image a focused image of a feature on the substrate, measuring positions of several features simultaneously, even though the substrate is not at the same level below all the sensors. The processor can also include corrections to reduce depth dependency of an apparent position of the feature include a viewpoint correction. The data processor can also derive measurements of heights of features on the substrate.
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公开(公告)号：US10754258B2
公开(公告)日：2020-08-25
申请号：US15922881
申请日：2018-03-15
发明人： Erik Willem Bogaart
摘要： A lithographic apparatus includes a number of sensors for measuring positions of features on a substrate prior to applying a pattern. Each sensor includes an imaging optical system. Position measurements are extracted from pixel data supplied by an image detector in each sensor. The imaging optical system includes one or more light field modulating elements and the processor processes the pixel data as a light-field image to extract the position measurements. The data processor may derive from each light-field image a focused image of a feature on the substrate, measuring positions of several features simultaneously, even though the substrate is not at the same level below all the sensors. The processor can also include corrections to reduce depth dependency of an apparent position of the feature include a viewpoint correction. The data processor can also derive measurements of heights of features on the substrate.
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