公开(公告)号：US20040108465A1

公开(公告)日：2004-06-10

申请号：US10644954

申请日：2003-08-21

Applicant: ASML NETHERLANDS B.V

Inventor： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

IPC: A61N005/00 ,  G21G005/00

CPC classification number: G03F7/70166 ,  G03F7/70058 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70916 ,  G03F7/70983

Abstract: A lithographic projection apparatus for EUV lithography includes a foil trap. The foil trap forms an open structure after the EUV source to let the EUV radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the EUV radiation can be transferred on debris present in the EUV beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced.

Abstract translation: 用于EUV光刻的光刻投影装置包括箔陷阱。 在EUV源之后，箔陷阱形成开放结构，以使EUV辐射不受阻碍地通过。 箔捕获器被配置为围绕光轴可旋转。 通过旋转箔阱，可以在EUV波束中存在的碎片上传输横向于EUV辐射传播方向的脉冲。 这个碎片不会通过箔片陷阱。 以这种方式，箔陷阱下游的光学部件上的碎屑的量减少。

公开(公告)号：US20040109151A1

公开(公告)日：2004-06-10

申请号：US10639753

申请日：2003-08-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

IPC: G03B027/72

CPC classification number: B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

Abstract: A lithographic projection apparatus includes a radiation system configured to form a projection beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the projection beam provides the projection beam with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

Abstract translation: 光刻投影设备包括辐射系统，该辐射系统被配置为从由辐射源发射的辐射形成辐射的投射光束，以及被配置为保持图案形成装置的支撑件，当图案形成装置被投影光束照射时，投影光束提供图案 。 衬底台被配置为保持衬底，并且投影系统被配置为将图案形成装置的照射部分成像到衬底的目标部分上。 辐射系统还包括距离光轴一定距离处的孔，当从源观察时，放置在孔后面的反射器和放置在孔后面的低辐射密集区域中的结构。

公开(公告)号：US20040094724A1

公开(公告)日：2004-05-20

申请号：US10647120

申请日：2003-08-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

IPC: G03F007/20

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70958

Abstract: A lithographic projection apparatus includes a grazing incidence collector. The grazing incidence collector is made up of several reflectors. In order to reduce the amount of heat on the collector, the reflectors are coated. The reflector at the exterior of the collector has an infrared radiating layer on the outside. The inner reflectors are coated with an EUV reflective layer on the outside.

Abstract translation: 光刻投影装置包括掠入射收集器。 放射入射收集器由多个反射器组成。 为了减少收集器上的热量，反射器被涂覆。 收集器外部的反射器在外部具有红外辐射层。 内部反射器在外部涂有EUV反射层。