公开(公告)号：US20040109151A1

公开(公告)日：2004-06-10

申请号：US10639753

申请日：2003-08-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

IPC: G03B027/72

CPC classification number: B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

Abstract: A lithographic projection apparatus includes a radiation system configured to form a projection beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the projection beam provides the projection beam with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

Abstract translation: 光刻投影设备包括辐射系统，该辐射系统被配置为从由辐射源发射的辐射形成辐射的投射光束，以及被配置为保持图案形成装置的支撑件，当图案形成装置被投影光束照射时，投影光束提供图案 。 衬底台被配置为保持衬底，并且投影系统被配置为将图案形成装置的照射部分成像到衬底的目标部分上。 辐射系统还包括距离光轴一定距离处的孔，当从源观察时，放置在孔后面的反射器和放置在孔后面的低辐射密集区域中的结构。

公开(公告)号：US20040109149A1

公开(公告)日：2004-06-10

申请号：US10716443

申请日：2003-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Van Elp ,  Martinus Hendrikus Antonius Leenders ,  Vadim Yevgenyevich Banine ,  Hugo Matthieu Visser ,  Levinus Pieter Bakker

IPC: G03B027/54 ,  G03B027/72

CPC classification number: G03F7/70575 ,  G03F7/70191 ,  G03F7/702

Abstract: In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.