公开(公告)号：US10018924B2

公开(公告)日：2018-07-10

申请号：US15014829

申请日：2016-02-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Siegfried Alexander Tromp ,  Jacobus Josephus Leijssen ,  Elisabeth Corinne Rodenburg ,  Maurice Wilhelmus Leonardus Hendricus Feijts ,  Hendrik Huisman

IPC: G03B27/58 ,  G03F7/20 ,  G01J5/20 ,  G01J5/02 ,  B05D3/02

CPC classification number: G03F7/70716 ,  B05D3/02 ,  G01J5/0285 ,  G01J5/20 ,  G03F7/70341 ,  G03F7/70708

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.