公开(公告)号：US11860546B2

公开(公告)日：2024-01-02

申请号：US17952119

申请日：2022-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70525

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US11454892B2

公开(公告)日：2022-09-27

申请号：US17315650

申请日：2021-05-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US11448976B2

公开(公告)日：2022-09-20

申请号：US16770464

申请日：2018-11-22

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Thomas Poiesz ,  Coen Hubertus Matheus Baltis ,  Abraham Alexander Soethoudt ,  Mehmet Ali Akbas ,  Dennis Van Den Berg ,  Wouter Vanesch ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

公开(公告)号：US11029607B2

公开(公告)日：2021-06-08

申请号：US16330544

申请日：2017-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.