公开(公告)号：US09465302B2

公开(公告)日：2016-10-11

申请号：US14704384

申请日：2015-05-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Clemens Johannes Gerardus Van Den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

IPC: G03B27/52 ,  G03B27/68 ,  G03B27/42 ,  G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

公开(公告)号：US20170023870A1

公开(公告)日：2017-01-26

申请号：US15287524

申请日：2016-10-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70866

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

Abstract translation: 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。

公开(公告)号：US11860546B2

公开(公告)日：2024-01-02

申请号：US17952119

申请日：2022-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70525

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US11454892B2

公开(公告)日：2022-09-27

申请号：US17315650

申请日：2021-05-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US11029607B2

公开(公告)日：2021-06-08

申请号：US16330544

申请日：2017-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US10649341B2

公开(公告)日：2020-05-12

申请号：US15287524

申请日：2016-10-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Clemens Johannes Gerardus Van Den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

IPC: G03B27/52 ,  G03F7/20

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.