公开(公告)号：US20190146352A1

公开(公告)日：2019-05-16

申请号：US16249518

申请日：2019-01-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G03F7/20 ,  H01L21/66 ,  G01N21/95

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

公开(公告)号：US10725390B2

公开(公告)日：2020-07-28

申请号：US16249518

申请日：2019-01-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G03F7/20 ,  H01L21/66 ,  G01N21/95 ,  H01L27/146 ,  H01L27/148

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

公开(公告)号：US10216100B2

公开(公告)日：2019-02-26

申请号：US15738701

申请日：2016-06-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G01N21/00 ,  G03F7/20 ,  H01L21/66 ,  G01N21/95 ,  H01L27/146 ,  H01L27/148

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

公开(公告)号：US11860546B2

公开(公告)日：2024-01-02

申请号：US17952119

申请日：2022-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70525

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US11454892B2

公开(公告)日：2022-09-27

申请号：US17315650

申请日：2021-05-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US11029607B2

公开(公告)日：2021-06-08

申请号：US16330544

申请日：2017-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.