公开(公告)号：US11448976B2

公开(公告)日：2022-09-20

申请号：US16770464

申请日：2018-11-22

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Thomas Poiesz ,  Coen Hubertus Matheus Baltis ,  Abraham Alexander Soethoudt ,  Mehmet Ali Akbas ,  Dennis Van Den Berg ,  Wouter Vanesch ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

公开(公告)号：US10719019B2

公开(公告)日：2020-07-21

申请号：US16315125

申请日：2017-07-06

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Thomas Poiesz ,  Satish Achanta ,  Mehmet Ali Akbas ,  Pavlo Antonov ,  Jeroen Bouwknegt ,  Joost Wilhelmus Maria Frenken ,  Evelyn Wallis Pacitti ,  Nicolaas Ten Kate ,  Bruce Tirri ,  Jan Verhoeven

IPC: G03F7/20 ,  H01L21/687

Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.

公开(公告)号：US12189310B2

公开(公告)日：2025-01-07

申请号：US17790341

申请日：2020-12-04

Applicant: ASML Holding N.V.

Inventor： Matthew Lipson ,  Mehmet Ali Akbas

IPC: G03F7/20 ,  C03C27/00 ,  G03F7/00 ,  H01L21/683

Abstract: Systems, apparatuses, and methods are provided for manufacturing an electrostatic clamp. An example method can include forming, during a first duration of time comprising a first time, a top clamp comprising a first set of electrodes and a plurality of burls. The method can further include forming, during a second duration of time comprising a second time that overlaps the first time, a core comprising a plurality of fluid channels configured to carry a thermally conditioned fluid. The method can further include forming, during a third duration of time comprising a third time that overlaps the first time and the second time, a bottom clamp comprising a second set of electrodes. In some aspects, the example method can include manufacturing the electrostatic clamp without an anodic bond.

公开(公告)号：US11270906B2

公开(公告)日：2022-03-08

申请号：US16756907

申请日：2018-10-04

Applicant: ASML HOLDING N.V.

Inventor： Mehmet Ali Akbas ,  David Hart Peterson ,  Tammo Uitterdijk ,  Michael Perry ,  Richard Bryan Lewis ,  Iliya Sigal

IPC: H01L21/687 ,  G03F7/20

Abstract: Various burl designs for holding an object in a lithographic apparatus are described. A lithographic apparatus includes an illumination system, a first support structure, a second support structure, and a projection system. The illumination system is designed to receive radiation and to direct the radiation towards a patterning device that forms patterned radiation. The first support structure is designed to support the patterning device on the first support structure. The second support structure has a plurality of burls and is designed to support the substrate on the plurality of burls. A topography of a top surface of each of the plurality of burls is not substantially flat, such that a contact area between the substrate and each of the plurality of burls is reduced. The projection system is designed to receive the patterned radiation and to direct the patterned radiation towards the substrate.

公开(公告)号：US11887881B2

公开(公告)日：2024-01-30

申请号：US17608238

申请日：2020-04-21

Applicant: ASML HOLDING N.V.

Inventor： Bruce Tirri ,  Ping Zhou ,  Elizabeth Mary Stone ,  David Hart Peterson ,  Mehmet Ali Akbas ,  Ryan Mayer ,  Richard Bryan Lewis

IPC: G03F7/00 ,  H01L21/687 ,  C23C16/513

CPC classification number: H01L21/68735 ,  C23C16/513 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/68757

Abstract: A method of fabricating a substrate table includes supporting a table base and disposing a coating on a surface of the table base. The surface of the table base is substantially flat. The coating has a non-uniform thickness. The coating exerts a stress on the table so as to bend the table base. The non-uniform thickness causes a surface of the coating to become substantially flat after the bending.

公开(公告)号：US12111581B2

公开(公告)日：2024-10-08

申请号：US17291086

申请日：2019-10-22

Applicant: ASML Holding N.V.

Inventor： Mehmet Ali Akbas ,  Tammo Uitterdijk ,  Christopher John Mason ,  Matthew Lipson ,  David Hart Peterson ,  Michael Perry ,  Peter Helmus ,  Jerry Jianguo Deng ,  Damoon Sohrabibabaheidary

IPC: G03F7/20 ,  G03F7/00 ,  H01L21/687

CPC classification number: G03F7/707 ,  G03F7/70491 ,  H01L21/6875

Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.