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    Substrate holder and a method of manufacturing a substrate holder
    1.
    发明授权
    Substrate holder and a method of manufacturing a substrate holder 有权

    公开(公告)号：US10719019B2

    公开(公告)日：2020-07-21

    申请号：US16315125

    申请日：2017-07-06

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： Thomas Poiesz ,  Satish Achanta ,  Mehmet Ali Akbas ,  Pavlo Antonov ,  Jeroen Bouwknegt ,  Joost Wilhelmus Maria Frenken ,  Evelyn Wallis Pacitti ,  Nicolaas Ten Kate ,  Bruce Tirri ,  Jan Verhoeven

    IPC: G03F7/20 ,  H01L21/687

    Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.

    Method of clamping a substrate to a clamping system, a substrate holder and a substrate support
    4.
    发明授权
    Method of clamping a substrate to a clamping system, a substrate holder and a substrate support 有权

    公开(公告)号：US12158704B2

    公开(公告)日：2024-12-03

    申请号：US17533947

    申请日：2021-11-23

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Abraham Alexander Soethoudt ,  Thomas Poiesz

    IPC: G03F7/00 ,  H01L21/683

    Abstract: A method including: generating a first force to attract a substrate holder to a support surface, the holder including a body having opposing first and second body surfaces, first burls at the first body surface, wherein each first burl has a distal end to support a substrate, and second burls at the second body surface to support the substrate holder on the support surface through contact with distal ends of the second burls; generating a second force to attract the substrate to the substrate holder; and controlling the first force and/or second force in a release step to deform the body between the second burls such as to create a gap between the distal ends of a first subset of the plurality of first burls and the substrate and such that the substrate is supported on distal ends of a second subset of the plurality of first burls.

    Substrate holder, a lithographic apparatus and method of manufacturing devices
    7.
    发明授权
    Substrate holder, a lithographic apparatus and method of manufacturing devices 有权

    公开(公告)号：US10453734B2

    公开(公告)日：2019-10-22

    申请号：US15580601

    申请日：2016-06-01

    Applicant: ASML Netherlands B.V.

    Inventor： Thomas Poiesz ,  Martijn Houben ,  Abraham Alexander Soethoudt

    IPC: G03B27/52 ,  H01L21/687 ,  G03F7/20 ,  B23H7/26 ,  H01L21/027 ,  H01L21/683

    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including: a main body having a main body surface; and a plurality of burls projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; a frictional force between the distal end of each burl and a substrate engaged therewith arises in a direction parallel to the support plane in the event of a relative movement of the substrate and substrate holder in the direction; and distal end surfaces of the burls are provided with a release structure configured so that the frictional force is less than would arise in the absence of the release structure.

    CLAMP FOR HOLDING AN OBJECT AND METHOD
    9.
    发明申请
    CLAMP FOR HOLDING AN OBJECT AND METHOD 有权

    公开(公告)号：US20240385536A1

    公开(公告)日：2024-11-21

    申请号：US18696657

    申请日：2022-10-14

    Applicant: ASML Netherlands B.V.

    Inventor： Thomas Poiesz ,  René Adrianus Van Rooij ,  Alexander Stein

    IPC: G03F7/00 ,  G03F7/16 ,  H01L21/683

    Abstract: The disclosure provides a clamp comprising a dielectric member; a conductive element disposed on the dielectric member and comprised of a first conductive material; and a number of burls arranged on the conductive element for supporting the object, each burl comprising a second conductive material, wherein the clamp comprises a stack of alternating layers of etch resistant material and a third conductive material arranged between the conductive element and the number of burls.

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