公开(公告)号：US09946172B2

公开(公告)日：2018-04-17

申请号：US15039795

申请日：2014-11-14

Applicant: ASML Netherlands B.V.

Inventor： Peter Paul Hempenius ,  Martijn Houben ,  Nicolaas Rudolf Kemper ,  Robertus Mathijs Gerardus Rijs ,  Paul Corné Henri De Wit ,  Stijn Willem Boere ,  Youssef Karel Maria De Vos ,  Frits Van Der Meulen

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70775 ,  G03F7/709

Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.

公开(公告)号：US10191396B2

公开(公告)日：2019-01-29

申请号：US15316526

申请日：2015-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Paul Corné Henri De Wit ,  Stijn Willem Boere ,  Youssef Karel Maria De Vos ,  Peter Paul Hempenius ,  Nicolaas Rudolf Kemper ,  Robertus Mathijs Gerardus Rijs ,  Frits Van Der Meulen

IPC: G03F7/20 ,  G03F9/00

Abstract: A temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further includes a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.