公开(公告)号：US09946172B2

公开(公告)日：2018-04-17

申请号：US15039795

申请日：2014-11-14

Applicant: ASML Netherlands B.V.

Inventor： Peter Paul Hempenius ,  Martijn Houben ,  Nicolaas Rudolf Kemper ,  Robertus Mathijs Gerardus Rijs ,  Paul Corné Henri De Wit ,  Stijn Willem Boere ,  Youssef Karel Maria De Vos ,  Frits Van Der Meulen

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70775 ,  G03F7/709

Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.

公开(公告)号：US10114299B2

公开(公告)日：2018-10-30

申请号：US15311544

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Mark Constant Johannes Baggen ,  Gerard Johannes Boogaard ,  Nicolaas Rudolf Kemper ,  Sander Kerssemakers ,  Robertus Mathijs Gerardus Rijs ,  Frank Johannes Jacobus Van Boxtel ,  Erwin Antonius Henricus Franciscus Van Den Boogaert ,  Marc Wilhelmus Maria Van Der Wijst ,  Martinus Van Duijnhoven ,  Jessica Henrica Anna Verdonschot ,  Hendrikus Herman Marie Cox

IPC: G10K11/168 ,  G03F7/20 ,  G10K11/16

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.

公开(公告)号：US10545414B2

公开(公告)日：2020-01-28

申请号：US15767524

申请日：2016-10-26

Applicant: ASML Netherlands B.V.

Inventor： Alexander Petrus Josephus Van Lankvelt ,  Ingmar August Kerp ,  Richardus Simon Antonius Oostveen ,  Marco Hendrikus Hermanus Oude Nijhuis ,  Robertus Mathijs Gerardus Rijs ,  Olav Johannes Seijger ,  Alexander Maurice Steenhoek

IPC: G03B27/42 ,  B64C17/06 ,  G03F7/20 ,  F16F15/02 ,  F16J15/52

Abstract: The invention relates to a vibration isolation system (VIS) comprising: —a base (10); —a coupling element (20) to be coupled to a vibration sensitive object; —a vibration isolator (30-34) arranged between the base and the coupling element; —a bellows (50) to be arranged between the VIS coupling element or the vibration isolator and a protective housing (40) surrounding the vibration sensitive object; and —one or more separate damping elements to act on convolutions of the bellows.

公开(公告)号：US10191396B2

公开(公告)日：2019-01-29

申请号：US15316526

申请日：2015-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Paul Corné Henri De Wit ,  Stijn Willem Boere ,  Youssef Karel Maria De Vos ,  Peter Paul Hempenius ,  Nicolaas Rudolf Kemper ,  Robertus Mathijs Gerardus Rijs ,  Frits Van Der Meulen

IPC: G03F7/20 ,  G03F9/00

Abstract: A temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further includes a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.

公开(公告)号：US09726985B2

公开(公告)日：2017-08-08

申请号：US14376210

申请日：2013-01-25

Applicant: ASML Netherlands B.V. ,  Koninklijke Philips Electronics N.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Antonius Franciscus Johannes De Groot ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Theodorus Petrus Maria Cadee ,  Robertus Mathijs Gerardus Rijs ,  Richard Henricus Adrianus Van Lieshout

IPC: G03B27/58 ,  G03F7/20 ,  H02K41/02

CPC classification number: G03F7/70716 ,  G03F7/70758 ,  G03F7/709 ,  H02K41/02

Abstract: A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.

公开(公告)号：US20140375975A1

公开(公告)日：2014-12-25

申请号：US14376210

申请日：2013-01-25

Applicant: ASML Netherlands B.V. ,  Koninklijke Philips Electronics N.V. `

Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Antonius Franciscus Johannes De Groot ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Theodorus Petrus Maria Cadee ,  Robertus Mathijs Gerardus Rijs ,  Richard Henricus Adrianus Van Lieshout

IPC: G03F7/20 ,  H02K41/02

CPC classification number: G03F7/70716 ,  G03F7/70758 ,  G03F7/709 ,  H02K41/02

Abstract: A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.

Abstract translation: 可移动台系统被配置为支撑经受光刻处理的物体。 短行程部件（SS）被配置为支撑物体（W），并且长行程部件（LS）被配置为支撑短行程部件。 短行程部分可以相对于长行程部分在相对较小的移动范围内移动。 长行程部件可相对于布置成支撑长行程部件的基座支撑件在相对较大的运动范围内移动。 屏蔽元件（SE）设置在短行程部件和长行程部件之间。 位置控制系统（PCS）在屏蔽元件和短行程部件之间保持基本恒定的距离。