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公开(公告)号：US11764030B2
公开(公告)日：2023-09-19
申请号：US16714549
申请日：2019-12-13
Applicant: ASML Netherlands B.V.
Inventor： Johannes Hubertus Antonius Van De Rijdt , Peter Paul Hempenius , Allard Eelco Kooiker , Jef Goossens , Petrus Wilhelmus Vleeshouwers
IPC: H01J37/20
CPC classification number: H01J37/20 , H01J2237/2007
Abstract: Disclosed is a stage apparatus comprising: an object support configured to support an object; a positioning device configured to position the object support; a first connection arrangement configured to connect the object support to the positioning device, the first connection arrangement comprising at least one damped connection; and a second connection arrangement configured to connect the object support to the positioning device, the second connection arrangement comprising at least one substantially rigid connection.
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公开(公告)号：US11621142B2
公开(公告)日：2023-04-04
申请号：US16992058
申请日：2020-08-12
Applicant: ASML Netherlands B.V.
Inventor： Marcel Koenraad Marie Baggen , Peter Paul Hempenius , Maarten Frans Janus Kremers , Robertus Jacobus Theodorus Van Kempen , Sven Antoin Johan Hol , Henricus Martinus Johannes Van De Groes , Johannes Hubertus Antonius Van De Rijdt , Niels Johannes Maria Bosch , Maarten Hartger Kimman
Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.
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公开(公告)号：US09946172B2
公开(公告)日：2018-04-17
申请号：US15039795
申请日：2014-11-14
Applicant: ASML Netherlands B.V.
Inventor： Peter Paul Hempenius , Martijn Houben , Nicolaas Rudolf Kemper , Robertus Mathijs Gerardus Rijs , Paul Corné Henri De Wit , Stijn Willem Boere , Youssef Karel Maria De Vos , Frits Van Der Meulen
CPC classification number: G03F7/70875 , G03F7/70775 , G03F7/709
Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.
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公开(公告)号：US11302512B2
公开(公告)日：2022-04-12
申请号：US16809519
申请日：2020-03-04
Applicant: ASML Netherlands B.V.
Inventor： Marcel Koenraad Marie Baggen , Antonius Henricus Arends , Lucas Kuindersma , Johannes Hubertus Antonius Van De Rijdt , Peter Paul Hempenius , Robertus Jacobus Theodorus Van Kempen , Niels Johannes Maria Bosch , Henricus Martinus Johannes Van De Groes , Kuo-Feng Tseng , Hans Butler , Michael Johannes Christiaan Ronde
IPC: H01J37/20
Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.
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Patent Agency Ranking
公开(公告)号：US20200303158A1
公开(公告)日：2020-09-24
申请号：US16870747
申请日：2020-05-08
Applicant: ASML Netherlands B.V.
Inventor： Niels Johannes Maria Bosch , Peter Paul Hempenius , Sven Antoin Johan HOL , Marcel Koenrood Marie Baggen
IPC: H01J37/20 , H01J37/09 , H01J37/304
Abstract: The invention relates to a particle beam apparatus comprising: a particle beam source configured to generate a particle beam; a magnetic coil configured to emit a magnetic field to manipulate the particle beam; an object table configured to hold a substrate; a positioning device comprising ferromagnetic material, the positioning device further comprising at least one motor configured to position the object table with respect to the particle beam; and a controller configured to provide a control signal to the at least one motor to at least partly compensate for a magnetic force induced by the magnetic field acting on the positioning device.
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公开(公告)号：US10809634B2
公开(公告)日：2020-10-20
申请号：US15921124
申请日：2018-03-14
Applicant: ASML Netherlands B.V.
Inventor： Peter Paul Hempenius , Marcel Koenraad Marie Baggen , Thomas Jan De Hoog , Sinar Juliana , Henricus Martinus Johannes Van De Groes
Abstract: Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuator for displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balance mass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement.
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公开(公告)号：US11798777B2
公开(公告)日：2023-10-24
申请号：US16824499
申请日：2020-03-19
Applicant: ASML Netherlands B.V.
Inventor： Martinus Gerardus Maria Johannes Maassen , Peter Paul Hempenius , Weiming Ren , Zhongwei Chen
IPC: H01J37/21 , H01J37/244 , H01J37/28
CPC classification number: H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0453 , H01J2237/2817
Abstract: A charged particle beam apparatus includes a beamlet forming unit configured to form and scan an array of beamlets on a sample. A first portion of the array of beamlets is focused onto a focus plane, and a second portion of the array of beamlets has at least one beamlet with a defocusing level with respect to the focus plane. The charged particle beam apparatus also includes a detector configured to detect an image of the sample formed by the array of beamlets, and a processor configured to estimate a level of separation between the focus plane and the sample based on the detected image and then reduce the level of separation based on the estimated level.
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公开(公告)号：US11315752B2
公开(公告)日：2022-04-26
申请号：US17118456
申请日：2020-12-10
Applicant: ASML Netherlands B.V.
Inventor： Peter Paul Hempenius , Sven Antoin Johan Hol , Maarten Frans Janus Kremers , Henricus Martinus Johannes Van De Groes , Niels Johannes Maria Bosch , Marcel Koenraad Marie Baggen
IPC: H01J37/20 , H01J37/09 , H01J37/317
Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
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公开(公告)号：US10191396B2
公开(公告)日：2019-01-29
申请号：US15316526
申请日：2015-05-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Paul Corné Henri De Wit , Stijn Willem Boere , Youssef Karel Maria De Vos , Peter Paul Hempenius , Nicolaas Rudolf Kemper , Robertus Mathijs Gerardus Rijs , Frits Van Der Meulen
Abstract: A temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further includes a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.
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