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公开(公告)号：US20210053177A1
公开(公告)日：2021-02-25
申请号：US16963576
申请日：2019-01-24
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Bert Dirk SCHOLTEN , Satish ACHANTA , Aydar AKCHURIN , Pavlo ANTONOV , Coen Hubertus Matheus BALTIS , Jeroen BOUWKNEGT , Ann-Sophie m. FARLE , Christopher John MASON , Ralph Nicholas PALERMO , Thomas POIESZ , Yuri Johannes Gabriel VAN DE VIJVER , Jimmy Matheus Wilhelmus VAN DE WINKEL
IPC: B24B27/033 , B24B1/04 , B24B7/07 , B24B7/22 , G03F7/20 , H01L21/304
Abstract: A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.
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公开(公告)号：US20200073262A1
公开(公告)日：2020-03-05
申请号：US16610103
申请日：2018-05-01
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： Matthew LIPSON , Christopher John MASON , Damoon SOHRABIBABAHEIDARY , Jimmy Matheus Wilhelmus VAN DE WINKEL , Bert Dirk SCHOLTEN
Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.
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公开(公告)号：US20170219933A1
公开(公告)日：2017-08-03
申请号：US15500866
申请日：2015-06-30
Applicant: ASML Netherlands B.V.
Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR , Victor Manuel BLANCO CARBALLO , Casper Roderik DE GROOT , Rolf Hendrikus Jacobus CUSTERS , David Merritt PHILLIPS , Frederik Antonius VAN DER ZANDEN , Pieter Lein Joseph GUNTER , Erik Henricus Egidius Catharina EUMMELEN , Yuri Johannes Gabriël VAN DE VIJVER , Bert Dirk SCHOLTEN , Marijn WOUTERS , Ronald Frank KOX , Jorge Alberto VIEYRA SALAS
CPC classification number: G03F7/70341 , G02B27/0043 , G03F7/2043 , G03F7/70358 , G03F7/70725 , G03F7/70858 , G03F7/70925
Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.
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4.发明公开公开(公告)号：US20240168394A1
公开(公告)日：2024-05-23
申请号：US18398860
申请日：2023-12-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Stef Marten Johan JANSSENS , Bert Dirk SCHOLTEN , Sjoerd Nicolaas Lambertus DONDERS , Teunis VAN DAM , Peter Mark OVERSCHIE , Theresa Mary SPAAN-BURKE , Siegfried Alexander TROMP
IPC: G03F7/00 , H01L21/683
CPC classification number: G03F7/70725 , G03F7/707 , G03F7/70783 , G03F7/70816 , H01L21/6838 , H01L21/67288
Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.
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5.发明申请公开(公告)号：US20190187571A1
公开(公告)日：2019-06-20
申请号：US16309501
申请日：2017-06-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Stef Marten Johan JANSSENS , Bert Dirk SCHOLTEN , Sjoerd Nicolaas Lambertus DONDERS , Teunis VAN DAM , Peter Mark OVERSCHIE , Theresa Mary SPAAN-BURKE , Siegfried Alexander TROMP
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F7/70625 , G03F7/707 , H01L21/67288 , H01L21/6838
Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.
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Patent Agency Ranking
公开(公告)号：US20190187568A1
公开(公告)日：2019-06-20
申请号：US16269745
申请日：2019-02-07
Applicant: ASML Netherlands B.V.
Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR , Victor Manuel BLANCO CARBALLO , Casper Roderik DE GROOT , Rolf Hendrikus Jacobus CUSTERS , David Merritt PHILLIPS , Frederik Antonius VAN DER ZANDEN , Pieter Lein Joseph GUNTER , Erik Henricus Egidius Catharina EUMMELEN , Yuri Johannes Gabriël VAN DE VIJVER , Bert Dirk SCHOLTEN , Marijn WOUTERS , Ronald Frank KOX , Jorge Alberto VIEYRA SALAS
CPC classification number: G03F7/70341 , G02B27/0043 , G03F7/2043 , G03F7/70358 , G03F7/70725 , G03F7/70858 , G03F7/70925
Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.
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公开(公告)号：US20210263418A1
公开(公告)日：2021-08-26
申请号：US17260649
申请日：2019-06-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Bert Dirk SCHOLTEN , Peter Andreas Maria BILLEKENS , Tiannan GUAN , Tjarco LINDEIJER , Harold Anton MEHAGNOUL , Jimmy Matheus Wilhelmus VAN DE WINKEL , Cas Johannes Petrus Maria VAN NUENEN , Hendrikus Theodorus Jacobus Franciscus VAN VERSEVELD , Marcus Martinus Petrus Adrianus VERMEULEN
Abstract: A tool for modifying substrate support elements of a substrate holder, the substrate support elements having support surfaces for supporting a substrate, the tool includes a main body having a main body surface, and multiple protrusions from the main body surface, the multiple protrusions having distal ends configured to contact the support surfaces to modify the substrate support elements. Furthermore, a lithographic apparatus and a method comprising such a tool are provided.
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公开(公告)号：US20200183287A1
公开(公告)日：2020-06-11
申请号：US15779804
申请日：2016-11-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Günes NAKIBOGLU , Coen Hubertus Matheus BALTIS , Siegfried Alexander TROMP , Yuri Johannes Gabriël VAN DE VIJVER , Bert Dirk SCHOLTEN , Daan Daniel Johannes Antonius VAN SOMMEREN , Mark Johannes Hermanus FRENCKEN
IPC: G03F7/20 , H01L21/687 , H01L21/027
Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
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9.发明申请公开(公告)号：US20190043749A1
公开(公告)日：2019-02-07
申请号：US16075754
申请日：2016-12-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Robby Franciscus Josephus MARTENS , Youssef Karel Maria DE VOS , Ringo Petrus Cornelis VAN DORST , Gerhard Albert TEN BRINKE , Dirk Jerome Andre SENDEN , Coen Hubertus Matheus BALTIS , Justin Johannes Hermanus GERRITZEN , Jelmer Mattheüs KAMMINGA , Evelyn Wallis PACITTI , Thomas POIESZ , Arie Cornelis SCHEIBERLICH , Bert Dirk SCHOLTEN , André SCHREUDER , Abraham Alexander SOETHOUDT , Siegfried Alexander TROMP , Yuri Johannes Gabriël VAN DE VIJVER
IPC: H01L21/683 , G03F7/20 , H01L21/687 , B25B11/00
Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
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10.发明公开公开(公告)号：US20230260820A1
公开(公告)日：2023-08-17
申请号：US18305925
申请日：2023-04-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Robby Franciscus Josephus MARTENS , Youssef Karel Maria DE VOS , Ringo Petrus Cornelis VAN DORST , Gerhard Albert TEN BRINKE , Dirk Jerome Andre SENDEN , Coen Hubertus Matheus BALTIS , Justin Johannes Hermanus GERRITZEN , Jelmer Mattheüs KAMMINGA , Evelyn Wallis PACITTI , Thomas POIESZ , Arie Cornelis SCHEIBERLICH , Bert Dirk SCHOLTEN , André SCHREUDER , Abraham Alexander SOETHOUDT , Siegfried Alexander TROMP , Yuri Johannes Gabriël VAN DE VIJVER
IPC: H01L21/683 , G03F7/00 , H01L21/687 , B25B11/00
CPC classification number: H01L21/6838 , G03F7/707 , G03F7/70733 , H01L21/68742 , B25B11/005
Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
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