公开(公告)号：US20180314169A1

公开(公告)日：2018-11-01

申请号：US16026195

申请日：2018-07-03

Applicant: ASML Netherlands B. V.

Inventor： Timotheus Franciscus SENGERS ,  Marcus Adrianus Van De Kerkhof ,  Mark Kroon ,  Kees Van Weert

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G03F7/70058 ,  G03F7/70191 ,  G03F7/70341 ,  G03F7/7055 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.

公开(公告)号：US20150346113A1

公开(公告)日：2015-12-03

申请号：US14825765

申请日：2015-08-13

Applicant: ASML Netherlands B. V.

Inventor： Marcus Adrianus Van De Kerkhof ,  Maurits Van Der Schaar ,  Hendrik Jan Hidde Smilde

IPC: G01N21/95 ,  G01N21/47 ,  G02B5/18 ,  G03F7/20

CPC classification number: G01N21/9501 ,  G01N21/4738 ,  G01N2201/06113 ,  G01N2201/10 ,  G02B5/1823 ,  G02B5/1861 ,  G03F7/70058 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/70 ,  G03F9/7046 ,  G03F9/7076 ,  H01L23/544 ,  H01L2924/0002 ,  Y10T428/24612 ,  H01L2924/00

Abstract: A second set of superimposed gratings are superposed over a first set of superimposed gratings. The second set of gratings have a different periodicity from the first set of gratings or a different orientation. Consequently the first order diffraction pattern from the second set of superimposed gratings can be distinguished from the first order diffraction pattern from the first set of superimposed gratings.

Abstract translation: 第二组叠加的光栅叠加在第一组叠加的光栅上。 第二组光栅具有与第一组光栅不同的周期性或不同的取向。 因此，来自第二组叠加光栅的一阶衍射图可以与来自第一组叠加光栅的一阶衍射图案区分开。

公开(公告)号：US10514618B2

公开(公告)日：2019-12-24

申请号：US16026195

申请日：2018-07-03

Applicant: ASML NETHERLANDS B. V.

Inventor： Timotheus Franciscus Sengers ,  Marcus Adrianus Van De Kerkhof ,  Mark Kroon ,  Kees Van Weert

IPC: G03B27/58 ,  G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.