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公开(公告)号：US20170191944A1
公开(公告)日：2017-07-06
申请号：US15387610
申请日：2016-12-21
发明人： Yevgeniy Konstantinovich SHMAREV , Stanislav SMIRNOV , Chien-Hung TSENG , Armand Eugene Albert KOOLEN
IPC分类号： G01N21/88 , G01N21/95 , G03F7/20 , G01N21/956
CPC分类号： G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/8822 , G01N2021/95676 , G01N2201/0638 , G03F7/70625 , G03F7/70641
摘要： An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.
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公开(公告)号：US20180045657A1
公开(公告)日：2018-02-15
申请号：US15664808
申请日：2017-07-31
发明人： Stanislav SMIRNOV , Johannes Matheus Marie DE WIT , Teunis Willem TUKKER , Armand Eugene Albert KOOLEN
CPC分类号： G01N21/9515 , G01N21/47 , G02B21/10 , G02B27/0075 , G03F7/70616
摘要： An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path and configured to adjust a shape of a wave front of the beam of EM radiation, the adaptive optical system including: a first aspherical optical element; a second aspherical optical element adjacent the first aspherical optical element; and an actuator configured to cause relative movement between the first optical element and the second optical element in a direction different from a beam axis of the portion of the EM radiation path.
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公开(公告)号：US20230062585A1
公开(公告)日：2023-03-02
申请号：US17856213
申请日：2022-07-01
发明人： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Armand Eugene Albert KOOLEN , Nitesh PANDEY , Vasco Tomas TENNER , Willem Marie Julia Marcel COENE , Patrick WARNAAR
摘要： Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US20130100427A1
公开(公告)日：2013-04-25
申请号：US13628697
申请日：2012-09-27
发明人： Armand Eugene Albert KOOLEN , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Peter Clement Paul Vanoppen , Michael Kubis
CPC分类号： G03F1/42 , G01B9/04 , G01N21/47 , G03F7/70616 , G03F7/70633 , G03F9/70 , G03F9/7069 , G03F9/7088
摘要： An approach is used to estimate and correct the overlay variation as function of offset for each measurement. A target formed on a substrate includes periodic gratings. The substrate is illuminated with a circular spot on the substrate with a size larger than each grating. Radiation scattered by each grating is detected in a dark-field scatterometer to obtain measurement signals. The measurement signals are used to calculate overlay. The dependence (slope) of the overlay as a function of position in the illumination spot is determined. An estimated value of the overlay at a nominal position such as the illumination spot's center can be calculated, correcting for variation in the overlay as a function of the target's position in the illumination spot. This compensates for the effect of the position error in the wafer stage movement, and the resulting non-centered position of the target in the illumination spot.
摘要翻译： 一种方法用于估计和校正覆盖变化作为每个测量的偏移函数。 形成在衬底上的靶包括周期性光栅。 在衬底上用圆形点照射衬底，其尺寸大于每个光栅。 在暗场散射仪中检测由每个光栅散射的辐射，以获得测量信号。 测量信号用于计算叠加。 确定覆盖层与照明点中位置的函数关系（斜率）。 可以计算在诸如照明点中心的标称位置处的覆盖物的估计值，以根据目标在照明点中的位置的函数来校正覆盖物的变化。 这补偿了晶片台移动中的位置误差的影响，以及目标在照明点中产生的非居中位置。
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5.发明公开公开(公告)号：US20240319620A1
公开(公告)日：2024-09-26
申请号：US18650790
申请日：2024-04-30
发明人： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Armand Eugene Albert KOOLEN , Nitesh PANDEY , Vasco Tomas TENNER , Willem Marie Julia Marcel COENE , Patrick WARNAAR
CPC分类号： G03F7/7085 , G01B11/02 , G01B11/0625 , G01N21/4788 , G01N21/9501 , G03F7/70158 , G03F7/705 , G03F7/70625 , G03F7/70633 , G03F9/7088 , G01B2210/56
摘要： Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US20240184215A1
公开(公告)日：2024-06-06
申请号：US18286327
申请日：2022-03-23
IPC分类号： G03F7/00
CPC分类号： G03F7/70516 , G03F7/70025 , G03F7/70633
摘要： Disclosed is a method of determining a correction for a measurement of a target and an associated apparatus. The measurement is subject to a target-dependent correction parameter which has a dependence the target and/or a stack on which the target is comprised. The method comprises obtaining first measurement data relating to a measurement of a fiducial target, said first measurement data comprising at least a first and second set of intensity parameter values: and second measurement data relating to a measurement of the fiducial target, the second measurement data comprising a third set of intensity parameter values. A target-invariant correction parameter is determined from said first measurement data and second measurement data. the target-invariant correction parameter being a component of the target-dependent correction parameter which is not dependent on the target and/or a stack: and the correction is determined from said target-in-variant correction parameter.
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7.发明申请公开(公告)号：US20190250094A1
公开(公告)日：2019-08-15
申请号：US16268564
申请日：2019-02-06
发明人： Nitesh PANDEY , Zili ZHOU , Gerbrand VAN DER ZOUW , Arie Jeffrey DEN BOEF , Markus Gerardus Martinus Maria VAN KRAAIJ , Armand Eugene Albert KOOLEN , Hugo Augustinus Joseph CRAMER , Paul Christiaan HINNEN , Martinus Hubertus Maria VAN WEERT , Anagnostis TSIATMAS , Shu-jin WANG , Bastiaan Onne FAGGINGER AUER , Alok VERMA
CPC分类号： G01N21/21 , G01N21/8806 , G01N2021/8848 , G03F7/70191 , G03F7/70616 , G03F7/70625 , G03F7/70633
摘要： An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.
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公开(公告)号：US20180292757A1
公开(公告)日：2018-10-11
申请号：US15941324
申请日：2018-03-30
IPC分类号： G03F7/20 , G03F9/00 , G01N21/47 , G01N21/95 , G01N21/956
摘要： A radiation receiving system for an inspection apparatus, used to perform measurements on target structures on lithographic substrates as part of a lithographic process, comprises a spectrometer with a number of inputs. The radiation receiving system comprises: a plurality of inputs, each input being arranged to provide radiation from a target structure; a first optical element operable to receive radiation from each of the plurality of inputs; a second optical element operable to receive radiation from the first optical element and to scatter the radiation; and a third optical element operable to direct the scattered radiation onto a detector. The second optical element may for example be a reflective diffraction grating that diffracts incoming radiation into an output radiation spectrum.
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公开(公告)号：US20170097575A1
公开(公告)日：2017-04-06
申请号：US15279860
申请日：2016-09-29
CPC分类号： G03F7/70625 , G01B11/272 , G01N21/47 , G03F7/7015 , G03F7/706 , G03F7/70633
摘要： Disclosed is a metrology apparatus for measuring a parameter of a lithographic process, and associated computer program and method. The metrology apparatus comprises an optical system for measuring a target on a substrate by illuminating the target with measurement radiation and detecting the measurement radiation scattered by the target; and an array of lenses. Each lens of the array is operable to focus the scattered measurement radiation onto a sensor, said array of lenses thereby forming an image on the sensor which comprises a plurality of sub-images, each sub-image being formed by a corresponding lens of the array of lenses. The resulting plenoptic image comprises image plane information from the sub-images, wavefront distortion information (from the relative positions of the sub-images) and pupil information from the relative intensities of the sub-images.
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10.发明申请Metrology Method and Apparatus, Substrate, Lithographic System and Device Manufacturing Method 有权计量方法与仪器，基板，平版印刷系统及器件制造方法公开(公告)号：US20170068173A1
公开(公告)日：2017-03-09
申请号：US15355334
申请日：2016-11-18
IPC分类号： G03F7/20
CPC分类号： G03F7/70625 , G03F7/70483 , G03F7/70633 , G03F7/70683
摘要： A metrology target formed by a lithographic process on a substrate includes a plurality of component gratings. Images of the target are formed using +1 and −1 orders of radiation diffracted by the component gratings. Regions of interest (ROIs) in the detected image are identified corresponding the component gratings. Intensity values within each ROI are processed and compared between images, to obtain a measurement of asymmetry and hence overlay error. Separation zones are formed between the component gratings and design so as to provide dark regions in the image. In an embodiment, the ROIs are selected with their boundaries falling within the image regions corresponding to the separation zones. By this measure, the asymmetry measurement is made more tolerant of variations in the position of the ROI. The dark regions also assist in recognition of the target in the images.
摘要翻译： 由基板上的光刻工艺形成的测量目标包括多个分量光栅。 使用由分量光栅衍射的+1和-1次辐射来形成目标的图像。 识别检测到的图像中的感兴趣区域（ROI）对应于分量光栅。 在每个ROI内的强度值被处理并在图像之间进行比较，以获得不对称性的测量并因此获得覆盖误差。 在分量光栅之间形成分离区并设计成在图像中提供暗区。 在一个实施例中，选择其边界落入对应于分离区域的图像区域内的ROI。 通过这种措施，使不对称测量更加容忍ROI的位置的变化。 黑暗的地区也有助于识别图像中的目标。
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