公开(公告)号：US20140176929A1

公开(公告)日：2014-06-26

申请号：US14190147

申请日：2014-02-26

Applicant: ASML Netherlands B.V.

Inventor： Kars Zeger TROOST ,  Arno Jan Bleeker

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70425

Abstract: A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step.

Abstract translation: 使用系统和方法来制造使用至少一个曝光步骤的装置。 每个曝光步骤将图案化的辐射束投射到衬底上。 图案化的波束包括多个像素。 每个像素在曝光步骤中向目标部分提供不大于预定正常最大剂量的辐射剂量，和/或至少一个所选择的像素传递大于正常最大剂量的增加的辐射剂量。 可以递送增加的剂量以补偿阵列中与已选择像素相邻的像素上的已知位置处的有缺陷元件的影响，或补偿由于该位置的曝光导致的所选像素位置处的目标部分的曝光不足 涉及在另一曝光步骤中受已知缺陷元件影响的像素。

公开(公告)号：US20170123323A1

公开(公告)日：2017-05-04

申请号：US15405009

申请日：2017-01-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Vitaliy PROSYENTSOV ,  Willem Jurrianus VENEMA ,  Kars Zeger TROOST ,  Adrianus Martinus VAN DER WIELEN

IPC: G03F7/20 ,  G03F1/44

CPC classification number: G03F7/705 ,  G03F1/44 ,  G03F7/70133 ,  G03F7/70783 ,  G03F7/70875

Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a fine (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.