公开(公告)号：US20240264537A1

公开(公告)日：2024-08-08

申请号：US18682692

申请日：2022-07-05

Applicant: ASML Netherlands B.V.

Inventor： Gijs TEN HAAF ,  Niels HAVIK ,  Joost ROOZE ,  Vu Quang TRAN

IPC: G03F7/00 ,  G03F9/00 ,  G06F30/398

CPC classification number: G03F7/705 ,  G03F7/70508 ,  G03F7/70633 ,  G03F7/706837 ,  G03F7/706839 ,  G03F9/7046 ,  G06F30/398

Abstract: Disclosed is a method for modeling alignment data over a substrate area relating to a substrate being exposed in a lithographic process. The method comprises obtaining alignment data relating to said substrate and separating the alignment data into systematic component which is relatively stable between different substrates and a non-systematic component which is not relatively stable between different substrates. The systematic component and the non-systematic component are individually modeled and a process correction for the substrate determined based on the modeled systematic component and modeled non-systematic component.

公开(公告)号：US20210132509A1

公开(公告)日：2021-05-06

申请号：US17049707

申请日：2019-04-03

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Simon Reinald HUISMAN ,  Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY ,  Yuxiang LIN ,  Vu Quang TRAN ,  Sebastianus Adrianus GOORDEN ,  Justin Lloyd KREUZER ,  Christopher John MASON ,  Igor Matheus Petronella AARTS ,  Krishanu SHOME ,  Irit TZEMAH

IPC: G03F7/20 ,  G03F9/00

Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.